Dose performance characterization of extreme ultraviolet exposure system using enhanced energy sensitivity by resist contrast method

Characterization of the systematic and random dose errors of an extreme ultraviolet (EUV) exposure system is performed using an EUV resist as an energy sensor for fast and repeatable measurements. Dose error measurement is enabled by a critical phenomenon that occurs when the photoresist is exposed...

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Veröffentlicht in:	Journal of vacuum science and technology. B, Nanotechnology & microelectronics Nanotechnology & microelectronics, 2016-07, Vol.34 (4)
Hauptverfasser:	Kim, Insung, Heo, JinSeok, Park, Changmin, Hwang, Myeongsu, Kim, Seong-Sue, Hahn, Jae W.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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