High precision dynamic alignment and gap control for optical near-field nanolithography

The authors demonstrate the use of interferometric-spatial-phase-imaging (ISPI) to control a gap distance of the order of nanometers for parallel optical near-field nanolithography. In optical near-field nanolithography, the distance between the optical mask and the substrate needs to be controlled...

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Veröffentlicht in:	Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2013-07, Vol.31 (4)
Hauptverfasser:	Wen, Xiaolei, Traverso, Luis M., Srisungsitthisunti, Pornsak, Xu, Xianfan, Moon, Euclid E.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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