Low ion energy RF reactor using an array of plasmas through a grounded grid

A reactor using localized remote plasma in a grid electrode is presented in this study. The aim is to reduce the ion bombardment energy inherent in RF capacitively coupled parallel plate reactors used to deposit large area thin film silicon solar cells. High ion bombardment energy could cause defect...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2013-03, Vol.31 (2)
Hauptverfasser:	Chesaux, Michaël, Howling, Alan A., Hollenstein, Christoph, Dominé, Didier, Kroll, Ulrich
Format:	Artikel
Sprache:	eng
Schlagworte:	70 PLASMA PHYSICS AND FUSION TECHNOLOGY ASYMMETRY CHEMICAL VAPOR DEPOSITION DEFECTS GRIDS HIGH-FREQUENCY DISCHARGES MATERIALS SCIENCE PLASMA DENSITY PLASMA POTENTIAL SILICON SILICON SOLAR CELLS
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!