Study on the etching characteristics of amorphous carbon layer in oxygen plasma with carbonyl sulfide

Carbonyl sulfide (COS) was added to oxygen as the additive etch gas for etching of amorphous carbon layers (ACL), and its effect on the etching characteristics of ACLs as the etch mask for high aspect ratio contact SiO2 etching was investigated. When a 50 nm amorphous carbon hole was etched in a gas...

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Veröffentlicht in:	Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2013-03, Vol.31 (2)
Hauptverfasser:	Kim, Jong Kyu, Cho, Sung Il, Kim, Nam Gun, Jhon, Myung S., Min, Kyung Suk, Kim, Chan Kyu, Yeom, Geun Young
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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