Density multiplication of nanostructures fabricated by ultralow voltage electron beam lithography using PMMA as positive- and negative-tone resist
The authors report a density multiplication process for nanoscale patterns composed of dots and lines using electron beam lithography with low voltage 1 keV exposures and cold development. The density doubling is achieved in a single exposure-development step using polymethylmethacrylate (PMMA) as t...
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| Veröffentlicht in: | Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena Microelectronics and nanometer structures processing, measurement and phenomena, 2011-11, Vol.29 (6), p.06F312-06F312-8 |
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| Hauptverfasser: | , , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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