Process-structure-property correlations in pulsed dc reactive magnetron sputtered vanadium oxide thin films

Cathode hysteresis in the reactive pulsed dc sputtering of a vanadium metal target was investigated to correlate the structural and electrical properties of the resultant vanadium oxide thin films within the framework of Berg’s model [Berg et al., J. Vac. Sci. Technol. A 5, 202 (1987)]. The process...

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Veröffentlicht in:	Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films International Journal Devoted to Vacuum, Surfaces, and Films, 2011-11, Vol.29 (6), p.061504-061504-7
Hauptverfasser:	Venkatasubramanian, Chandrasekaran, Cabarcos, Orlando M., Drawl, William R., Allara, David L., Ashok, S., Horn, Mark W., Bharadwaja, S. S. N.
Format:	Artikel
Sprache:	eng
Schlagworte:	ARGON CATHODES CHARGE TRANSPORT CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY CRYSTAL STRUCTURE CURRENTS ELECTRIC CONDUCTIVITY FLOW RATE GAS FLOW HYSTERESIS MAGNETRONS MATERIALS SCIENCE MICROSTRUCTURE OXYGEN POWER DENSITY RAMAN SPECTROSCOPY SPUTTERING THIN FILMS VANADIUM VANADIUM OXIDES
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