Assessment of release properties in UV nanoimprint lithography using high-aspect-ratio nanoscale molds

Ultraviolet nanoimprint lithography (UV-NIL) is a potentially powerful tool for nanofabrication. However, the strong force required during the release step degrades the release coating layer, which leads to defects in pattern replication and eventual breakage of the mold. Therefore, optimal conditio...

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Veröffentlicht in:	Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena Microelectronics and nanometer structures processing, measurement and phenomena, 2010-11, Vol.28 (6), p.C6M23-C6M27
Hauptverfasser:	Takahashi, Junki, Taniguchi, Jun, Kamiya, Yasuhiro
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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