Highly conformal film growth by chemical vapor deposition. II. Conformality enhancement through growth inhibition

The authors present a novel strategy for enhancing conformality in chemical vapor deposition (CVD) based on the concept of growth inhibition. In Part I, they showed how surface site blocking was responsible for the increase in conformality observed at higher pressures in high vapor pressure precurso...

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Veröffentlicht in:	Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2009-09, Vol.27 (5), p.1244-1248
Hauptverfasser:	Yanguas-Gil, A., Kumar, N., Yang, Y., Abelson, J. R.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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