High rate deposition of photocatalytic TiO 2 films by dc magnetron sputtering using a TiO 2 − x target
Photocatalytic TiO 2 films were deposited on glass substrates by dc magnetron sputtering using a slightly reduced TiO 2 − x target ( 2 − x = 1.986 ; conductivity, 3.7 S cm − 1 ; density, 4.21 g / cm 3 ). The variation in the deposition rate as a function of the O 2 flow ratio did not show a hy...
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| Veröffentlicht in: | Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2008-07, Vol.26 (4), p.903-907 |
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| container_end_page | 907 |
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| container_issue | 4 |
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| container_title | Journal of vacuum science & technology. A, Vacuum, surfaces, and films |
| container_volume | 26 |
| creator | Sato, Yasushi Uebayashi, Akira Ito, Norihiro Kamiyama, Toshihisa Shigesato, Yuzo |
| description | Photocatalytic
TiO
2
films were deposited on glass substrates by dc magnetron sputtering using a slightly reduced
TiO
2
−
x
target (
2
−
x
=
1.986
; conductivity,
3.7
S
cm
−
1
; density,
4.21
g
/
cm
3
). The variation in the deposition rate as a function of the
O
2
flow ratio did not show a hysteresis curve at the “transition region” as seen in the case of a Ti metal target. The deposition rate using the
TiO
2
−
x
target in 100% Ar gas was approximately seven times higher than that using the Ti metal target in an “oxide mode.” The films postannealed in air at temperatures
≥
200
°
C
showed excellent photodecomposition characteristics of acetaldehyde
(
CH
3
CHO
)
as well as photoinduced hydrophilicity. |
| doi_str_mv | 10.1116/1.2870226 |
| format | Article |
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TiO
2
films were deposited on glass substrates by dc magnetron sputtering using a slightly reduced
TiO
2
−
x
target (
2
−
x
=
1.986
; conductivity,
3.7
S
cm
−
1
; density,
4.21
g
/
cm
3
). The variation in the deposition rate as a function of the
O
2
flow ratio did not show a hysteresis curve at the “transition region” as seen in the case of a Ti metal target. The deposition rate using the
TiO
2
−
x
target in 100% Ar gas was approximately seven times higher than that using the Ti metal target in an “oxide mode.” The films postannealed in air at temperatures
≥
200
°
C
showed excellent photodecomposition characteristics of acetaldehyde
(
CH
3
CHO
)
as well as photoinduced hydrophilicity.</description><identifier>ISSN: 0734-2101</identifier><identifier>EISSN: 1520-8559</identifier><identifier>DOI: 10.1116/1.2870226</identifier><identifier>CODEN: JVTAD6</identifier><language>eng</language><publisher>American Vacuum Society</publisher><ispartof>Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2008-07, Vol.26 (4), p.903-907</ispartof><rights>American Vacuum Society</rights><rights>2008 American Vacuum Society</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-s125f-f30b6a85faf5ad4dfdd35cda4f4c6af4dc8b5b09ba90c3167e9561cee55cc09d3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,794,4512,27924,27925</link.rule.ids></links><search><creatorcontrib>Sato, Yasushi</creatorcontrib><creatorcontrib>Uebayashi, Akira</creatorcontrib><creatorcontrib>Ito, Norihiro</creatorcontrib><creatorcontrib>Kamiyama, Toshihisa</creatorcontrib><creatorcontrib>Shigesato, Yuzo</creatorcontrib><title>High rate deposition of photocatalytic TiO 2 films by dc magnetron sputtering using a TiO 2 − x target</title><title>Journal of vacuum science & technology. A, Vacuum, surfaces, and films</title><description>Photocatalytic
TiO
2
films were deposited on glass substrates by dc magnetron sputtering using a slightly reduced
TiO
2
−
x
target (
2
−
x
=
1.986
; conductivity,
3.7
S
cm
−
1
; density,
4.21
g
/
cm
3
). The variation in the deposition rate as a function of the
O
2
flow ratio did not show a hysteresis curve at the “transition region” as seen in the case of a Ti metal target. The deposition rate using the
TiO
2
−
x
target in 100% Ar gas was approximately seven times higher than that using the Ti metal target in an “oxide mode.” The films postannealed in air at temperatures
≥
200
°
C
showed excellent photodecomposition characteristics of acetaldehyde
(
CH
3
CHO
)
as well as photoinduced hydrophilicity.</description><issn>0734-2101</issn><issn>1520-8559</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2008</creationdate><recordtype>article</recordtype><sourceid/><recordid>eNqNkM1KAzEURoMoWKsL3yBrYepNZpLObAQp2gqFbuo63MnPNNJ2hiQV-waufUSfxA4WuhM3924OB85HyC2DEWNM3rMRL8fAuTwjAyY4ZKUQ1TkZwDgvMs6AXZKrGN8ADgzIAVnNfLOiAZOlxnZt9Mm3W9o62q3a1GpMuN4nr-nSLyinzq83kdZ7ajTdYLO1KRzo2O1SssFvG7qL_cUj_v35RT9owtDYdE0uHK6jvTn-IXl9flpOZtl8MX2ZPM6zyLhwmcuhllgKh06gKYwzJhfaYOEKLdEVRpe1qKGqsQKdMzm2lZBMWyuE1lCZfEgefr1R-4R9jeqC32DYKwaq30gxddyob1d9uzq1HwR3_xb8Bb-34QSqzrj8BwSBf84</recordid><startdate>200807</startdate><enddate>200807</enddate><creator>Sato, Yasushi</creator><creator>Uebayashi, Akira</creator><creator>Ito, Norihiro</creator><creator>Kamiyama, Toshihisa</creator><creator>Shigesato, Yuzo</creator><general>American Vacuum Society</general><scope/></search><sort><creationdate>200807</creationdate><title>High rate deposition of photocatalytic TiO 2 films by dc magnetron sputtering using a TiO 2 − x target</title><author>Sato, Yasushi ; Uebayashi, Akira ; Ito, Norihiro ; Kamiyama, Toshihisa ; Shigesato, Yuzo</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-s125f-f30b6a85faf5ad4dfdd35cda4f4c6af4dc8b5b09ba90c3167e9561cee55cc09d3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2008</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Sato, Yasushi</creatorcontrib><creatorcontrib>Uebayashi, Akira</creatorcontrib><creatorcontrib>Ito, Norihiro</creatorcontrib><creatorcontrib>Kamiyama, Toshihisa</creatorcontrib><creatorcontrib>Shigesato, Yuzo</creatorcontrib><jtitle>Journal of vacuum science & technology. A, Vacuum, surfaces, and films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Sato, Yasushi</au><au>Uebayashi, Akira</au><au>Ito, Norihiro</au><au>Kamiyama, Toshihisa</au><au>Shigesato, Yuzo</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>High rate deposition of photocatalytic TiO 2 films by dc magnetron sputtering using a TiO 2 − x target</atitle><jtitle>Journal of vacuum science & technology. A, Vacuum, surfaces, and films</jtitle><date>2008-07</date><risdate>2008</risdate><volume>26</volume><issue>4</issue><spage>903</spage><epage>907</epage><pages>903-907</pages><issn>0734-2101</issn><eissn>1520-8559</eissn><coden>JVTAD6</coden><abstract>Photocatalytic
TiO
2
films were deposited on glass substrates by dc magnetron sputtering using a slightly reduced
TiO
2
−
x
target (
2
−
x
=
1.986
; conductivity,
3.7
S
cm
−
1
; density,
4.21
g
/
cm
3
). The variation in the deposition rate as a function of the
O
2
flow ratio did not show a hysteresis curve at the “transition region” as seen in the case of a Ti metal target. The deposition rate using the
TiO
2
−
x
target in 100% Ar gas was approximately seven times higher than that using the Ti metal target in an “oxide mode.” The films postannealed in air at temperatures
≥
200
°
C
showed excellent photodecomposition characteristics of acetaldehyde
(
CH
3
CHO
)
as well as photoinduced hydrophilicity.</abstract><pub>American Vacuum Society</pub><doi>10.1116/1.2870226</doi><tpages>5</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0734-2101 |
| ispartof | Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2008-07, Vol.26 (4), p.903-907 |
| issn | 0734-2101 1520-8559 |
| language | eng |
| recordid | cdi_scitation_primary_10_1116_1_2870226 |
| source | AIP Journals Complete |
| title | High rate deposition of photocatalytic TiO 2 films by dc magnetron sputtering using a TiO 2 − x target |
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