Fabrication of 3D-photonic crystals via UV-nanoimprint lithography

Optical lithography will reach its limits due to the diffraction effects encountered and the necessity for using complex resolution enhancement techniques like optical proximity correction, phase shift masks, and off-axis illumination [L. W. Liebmann et al. , in Advanced Semiconductor Lithography (2...

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Veröffentlicht in:	Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena Microelectronics and nanometer structures processing, measurement and phenomena, 2007-11, Vol.25 (6), p.2337-2340
Hauptverfasser:	Glinsner, Thomas, Lindner, Paul, Mühlberger, Michael, Bergmair, Iris, Schöftner, Rainer, Hingerl, Kurt, Schmid, Holger, Kley, Ernst-Bernhard
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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