Growth and simulation of high-aspect ratio nanopillars by primary and secondary electron-induced deposition

While several studies have suggested that secondary electrons dominate electron beam induced deposition (EBID), we demonstrate that primary electrons (PE’s) contribute significantly to the deposition for nanoscale EBID over the electron beam energy range ( 500 – 20 keV ) . High-aspect ratio pillar g...

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Veröffentlicht in:	Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2005-11, Vol.23 (6), p.2825-2832
Hauptverfasser:	Fowlkes, J. D., Randolph, S. J., Rack, P. D.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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