Hollow electrode enhanced radio frequency glow plasma and its application to the chemical vapor deposition of microcrystalline silicon

A hollow electrode enhanced radio frequency (rf) glow plasma excitation technique and its application to the chemical vapor deposition of microcrystalline silicon films have been studied. In this technique, the reactor has two types of hollow structure. One is a hollow counterelectrode, and the othe...

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Veröffentlicht in:	Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2004-09, Vol.22 (5), p.2139-2144
Hauptverfasser:	Tabuchi, Toshihiro, Mizukami, Hiroyuki, Takashiri, Masayuki
Format:	Artikel
Sprache:	eng
Schlagworte:	CHEMICAL VAPOR DEPOSITION CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY ELECTRODES EMISSION SPECTRA EXCITATION GLOW DISCHARGES MATERIALS SCIENCE MHZ RANGE 01-100 MICROSTRUCTURE PHOTOSENSITIVITY PLASMA RADIOWAVE RADIATION SEMICONDUCTOR MATERIALS SILICON THIN FILMS
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