Nanoimprint lithography of chromophore molecules under high-vacuum conditions

We report on high-vacuum nanoimprint lithography onto chromophore dye molecules embedded in optically inert polymer matrices. A specifically designed high-vacuum (10 −5 –10 −6   mbar ) chamber to perform nanoimprint lithography at temperatures up to 300 ° C and pressures up to 10 5   psi on areas of...

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Veröffentlicht in:	Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2004-01, Vol.22 (1), p.185-188
Hauptverfasser:	Pisignano, Dario, Melcarne, Angelo, Mangiullo, Diego, Cingolani, Roberto, Gigli, Giuseppe
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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