Structural and optical properties of thin lead oxide films produced by reactive direct current magnetron sputtering
The structural and optical properties of thin lead oxide films were studied. Thin films were prepared by reactive dc magnetron sputtering of lead (Pb) targets in an Ar/O 2 mixture. The structure has been determined by x-ray diffraction measurements, which show that crystalline lead oxide films of di...
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| Veröffentlicht in: | Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2001-11, Vol.19 (6), p.2870-2878 |
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| container_title | Journal of vacuum science & technology. A, Vacuum, surfaces, and films |
| container_volume | 19 |
| creator | Venkataraj, S. Geurts, Jean Weis, Hansjörg Kappertz, Oliver Njoroge, Walter K. Jayavel, R. Wuttig, Matthias |
| description | The structural and optical properties of thin lead oxide films were studied. Thin films were prepared by reactive dc magnetron sputtering of lead (Pb) targets in an
Ar/O
2
mixture. The structure has been determined by x-ray diffraction measurements, which show that crystalline lead oxide films of different composition (PbO,
PbO
1.44
,
Pb
2
O
3
,
and
PbO
2
)
have been formed upon increasing oxygen flow (partial pressure). This result is confirmed by Raman spectroscopy. The effect of postdeposition annealing on the structural properties of PbO films reveals that the film structure is governed by both energetics and kinetics. X-ray reflectivity measurements were used to determine the thickness, density, and roughness of the films. The calculated film density values are almost equal to the bulk density of the material, showing that compact, nearly void free films are formed. The optical properties of the films have been studied from the reflectance and transmittance spectra recorded by optical spectroscopy measurements from 10 000 (1.24 eV) to 50 000 (6.21 eV)
cm
−1
.
From these data we have determined optical properties such as the dielectric function, the optical band gap
E
g
and the refractive index n as well as the film thickness. |
| doi_str_mv | 10.1116/1.1410948 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_scita</sourceid><recordid>TN_cdi_scitation_primary_10_1116_1_1410948</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>745648912</sourcerecordid><originalsourceid>FETCH-LOGICAL-c395t-b06eecdcb8c64bf3a5bec526a75a0f363a49d1d7619ea274c8571f63f257a27f3</originalsourceid><addsrcrecordid>eNp90E1LxDAQBuAgCq4fB_9BbqLQNUmbtD3K4hcseFDPIU0ma6RtapIu7r-3yy56EDzNDPMwDC9CF5TMKaXihs5pQUldVAdoRjkjWcV5fYhmpMyLjFFCj9FJjB-EEMaImKH4ksKo0xhUi1VvsB-S01M_BD9ASA4i9hand9fjFtS0_3IGsHVtF7fGjBoMbjY4gNLJrQEbF0AnrMcQoE-4U6seUvA9jsOYEgTXr87QkVVthPN9PUVv93evi8ds-fzwtLhdZjqvecoaIgC00U2lRdHYXPEGNGdClVwRm4tcFbWhphS0BsXKQle8pFbklvFymm1-ii53d6dHP0eISXYuamhb1YMfoywLLoqqpmySVzupg48xgJVDcJ0KG0mJ3OYqqdznOtnrnY3aJZWc73_w2odfKAdj_8N_L38DWL2JZg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>745648912</pqid></control><display><type>article</type><title>Structural and optical properties of thin lead oxide films produced by reactive direct current magnetron sputtering</title><source>AIP Journals Complete</source><creator>Venkataraj, S. ; Geurts, Jean ; Weis, Hansjörg ; Kappertz, Oliver ; Njoroge, Walter K. ; Jayavel, R. ; Wuttig, Matthias</creator><creatorcontrib>Venkataraj, S. ; Geurts, Jean ; Weis, Hansjörg ; Kappertz, Oliver ; Njoroge, Walter K. ; Jayavel, R. ; Wuttig, Matthias</creatorcontrib><description>The structural and optical properties of thin lead oxide films were studied. Thin films were prepared by reactive dc magnetron sputtering of lead (Pb) targets in an
Ar/O
2
mixture. The structure has been determined by x-ray diffraction measurements, which show that crystalline lead oxide films of different composition (PbO,
PbO
1.44
,
Pb
2
O
3
,
and
PbO
2
)
have been formed upon increasing oxygen flow (partial pressure). This result is confirmed by Raman spectroscopy. The effect of postdeposition annealing on the structural properties of PbO films reveals that the film structure is governed by both energetics and kinetics. X-ray reflectivity measurements were used to determine the thickness, density, and roughness of the films. The calculated film density values are almost equal to the bulk density of the material, showing that compact, nearly void free films are formed. The optical properties of the films have been studied from the reflectance and transmittance spectra recorded by optical spectroscopy measurements from 10 000 (1.24 eV) to 50 000 (6.21 eV)
cm
−1
.
From these data we have determined optical properties such as the dielectric function, the optical band gap
E
g
and the refractive index n as well as the film thickness.</description><identifier>ISSN: 0734-2101</identifier><identifier>EISSN: 1520-8559</identifier><identifier>DOI: 10.1116/1.1410948</identifier><identifier>CODEN: JVTAD6</identifier><language>eng</language><subject>Annealing ; Crystalline materials ; Dielectric films ; Energy gap ; Lead compounds ; Light reflection ; Magnetron sputtering ; Raman spectroscopy ; Refractive index ; X ray diffraction analysis</subject><ispartof>Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2001-11, Vol.19 (6), p.2870-2878</ispartof><rights>American Vacuum Society</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c395t-b06eecdcb8c64bf3a5bec526a75a0f363a49d1d7619ea274c8571f63f257a27f3</citedby><cites>FETCH-LOGICAL-c395t-b06eecdcb8c64bf3a5bec526a75a0f363a49d1d7619ea274c8571f63f257a27f3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,794,4512,27924,27925</link.rule.ids></links><search><creatorcontrib>Venkataraj, S.</creatorcontrib><creatorcontrib>Geurts, Jean</creatorcontrib><creatorcontrib>Weis, Hansjörg</creatorcontrib><creatorcontrib>Kappertz, Oliver</creatorcontrib><creatorcontrib>Njoroge, Walter K.</creatorcontrib><creatorcontrib>Jayavel, R.</creatorcontrib><creatorcontrib>Wuttig, Matthias</creatorcontrib><title>Structural and optical properties of thin lead oxide films produced by reactive direct current magnetron sputtering</title><title>Journal of vacuum science & technology. A, Vacuum, surfaces, and films</title><description>The structural and optical properties of thin lead oxide films were studied. Thin films were prepared by reactive dc magnetron sputtering of lead (Pb) targets in an
Ar/O
2
mixture. The structure has been determined by x-ray diffraction measurements, which show that crystalline lead oxide films of different composition (PbO,
PbO
1.44
,
Pb
2
O
3
,
and
PbO
2
)
have been formed upon increasing oxygen flow (partial pressure). This result is confirmed by Raman spectroscopy. The effect of postdeposition annealing on the structural properties of PbO films reveals that the film structure is governed by both energetics and kinetics. X-ray reflectivity measurements were used to determine the thickness, density, and roughness of the films. The calculated film density values are almost equal to the bulk density of the material, showing that compact, nearly void free films are formed. The optical properties of the films have been studied from the reflectance and transmittance spectra recorded by optical spectroscopy measurements from 10 000 (1.24 eV) to 50 000 (6.21 eV)
cm
−1
.
From these data we have determined optical properties such as the dielectric function, the optical band gap
E
g
and the refractive index n as well as the film thickness.</description><subject>Annealing</subject><subject>Crystalline materials</subject><subject>Dielectric films</subject><subject>Energy gap</subject><subject>Lead compounds</subject><subject>Light reflection</subject><subject>Magnetron sputtering</subject><subject>Raman spectroscopy</subject><subject>Refractive index</subject><subject>X ray diffraction analysis</subject><issn>0734-2101</issn><issn>1520-8559</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2001</creationdate><recordtype>article</recordtype><recordid>eNp90E1LxDAQBuAgCq4fB_9BbqLQNUmbtD3K4hcseFDPIU0ma6RtapIu7r-3yy56EDzNDPMwDC9CF5TMKaXihs5pQUldVAdoRjkjWcV5fYhmpMyLjFFCj9FJjB-EEMaImKH4ksKo0xhUi1VvsB-S01M_BD9ASA4i9hand9fjFtS0_3IGsHVtF7fGjBoMbjY4gNLJrQEbF0AnrMcQoE-4U6seUvA9jsOYEgTXr87QkVVthPN9PUVv93evi8ds-fzwtLhdZjqvecoaIgC00U2lRdHYXPEGNGdClVwRm4tcFbWhphS0BsXKQle8pFbklvFymm1-ii53d6dHP0eISXYuamhb1YMfoywLLoqqpmySVzupg48xgJVDcJ0KG0mJ3OYqqdznOtnrnY3aJZWc73_w2odfKAdj_8N_L38DWL2JZg</recordid><startdate>20011101</startdate><enddate>20011101</enddate><creator>Venkataraj, S.</creator><creator>Geurts, Jean</creator><creator>Weis, Hansjörg</creator><creator>Kappertz, Oliver</creator><creator>Njoroge, Walter K.</creator><creator>Jayavel, R.</creator><creator>Wuttig, Matthias</creator><scope>AAYXX</scope><scope>CITATION</scope><scope>7TC</scope></search><sort><creationdate>20011101</creationdate><title>Structural and optical properties of thin lead oxide films produced by reactive direct current magnetron sputtering</title><author>Venkataraj, S. ; Geurts, Jean ; Weis, Hansjörg ; Kappertz, Oliver ; Njoroge, Walter K. ; Jayavel, R. ; Wuttig, Matthias</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c395t-b06eecdcb8c64bf3a5bec526a75a0f363a49d1d7619ea274c8571f63f257a27f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2001</creationdate><topic>Annealing</topic><topic>Crystalline materials</topic><topic>Dielectric films</topic><topic>Energy gap</topic><topic>Lead compounds</topic><topic>Light reflection</topic><topic>Magnetron sputtering</topic><topic>Raman spectroscopy</topic><topic>Refractive index</topic><topic>X ray diffraction analysis</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Venkataraj, S.</creatorcontrib><creatorcontrib>Geurts, Jean</creatorcontrib><creatorcontrib>Weis, Hansjörg</creatorcontrib><creatorcontrib>Kappertz, Oliver</creatorcontrib><creatorcontrib>Njoroge, Walter K.</creatorcontrib><creatorcontrib>Jayavel, R.</creatorcontrib><creatorcontrib>Wuttig, Matthias</creatorcontrib><collection>CrossRef</collection><collection>Mechanical Engineering Abstracts</collection><jtitle>Journal of vacuum science & technology. A, Vacuum, surfaces, and films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Venkataraj, S.</au><au>Geurts, Jean</au><au>Weis, Hansjörg</au><au>Kappertz, Oliver</au><au>Njoroge, Walter K.</au><au>Jayavel, R.</au><au>Wuttig, Matthias</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Structural and optical properties of thin lead oxide films produced by reactive direct current magnetron sputtering</atitle><jtitle>Journal of vacuum science & technology. A, Vacuum, surfaces, and films</jtitle><date>2001-11-01</date><risdate>2001</risdate><volume>19</volume><issue>6</issue><spage>2870</spage><epage>2878</epage><pages>2870-2878</pages><issn>0734-2101</issn><eissn>1520-8559</eissn><coden>JVTAD6</coden><abstract>The structural and optical properties of thin lead oxide films were studied. Thin films were prepared by reactive dc magnetron sputtering of lead (Pb) targets in an
Ar/O
2
mixture. The structure has been determined by x-ray diffraction measurements, which show that crystalline lead oxide films of different composition (PbO,
PbO
1.44
,
Pb
2
O
3
,
and
PbO
2
)
have been formed upon increasing oxygen flow (partial pressure). This result is confirmed by Raman spectroscopy. The effect of postdeposition annealing on the structural properties of PbO films reveals that the film structure is governed by both energetics and kinetics. X-ray reflectivity measurements were used to determine the thickness, density, and roughness of the films. The calculated film density values are almost equal to the bulk density of the material, showing that compact, nearly void free films are formed. The optical properties of the films have been studied from the reflectance and transmittance spectra recorded by optical spectroscopy measurements from 10 000 (1.24 eV) to 50 000 (6.21 eV)
cm
−1
.
From these data we have determined optical properties such as the dielectric function, the optical band gap
E
g
and the refractive index n as well as the film thickness.</abstract><doi>10.1116/1.1410948</doi><tpages>9</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0734-2101 |
| ispartof | Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2001-11, Vol.19 (6), p.2870-2878 |
| issn | 0734-2101 1520-8559 |
| language | eng |
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| source | AIP Journals Complete |
| subjects | Annealing Crystalline materials Dielectric films Energy gap Lead compounds Light reflection Magnetron sputtering Raman spectroscopy Refractive index X ray diffraction analysis |
| title | Structural and optical properties of thin lead oxide films produced by reactive direct current magnetron sputtering |
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