In situ x-ray photoelectron spectroscopy for thin film synthesis monitoring

We describe an x-ray photoelectron spectroscopy spectrometer capable of determining the composition, thickness, and chemistry of thin film surfaces during growth. The instrument operates at pressures up to a few millitorr, an adequate range for many sputtering, low pressure chemical vapor deposition...

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Veröffentlicht in:	Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2001-09, Vol.19 (5), p.2127-2133
Hauptverfasser:	Kelly, M. A., Shek, M. L., Pianetta, P., Gür, T. M., Beasley, M. R.
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapor deposition Film growth Sputter deposition Substrates Synthesis (chemical) X ray photoelectron spectroscopy X ray spectrometers
Online-Zugang:	Volltext
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