Structural and optical properties of epitaxial ScxAl1−xN coherently grown on GaN bulk substrates by sputtering method

Three scandium aluminum nitride (ScAlN) thin films with different Sc compositions of 6%, 10%, and 14% were heteroepitaxially grown on n-type GaN bulk substrates by a low-temperature sputtering method. Atomically flat and smooth surfaces were observed by atomic force microscopy. The ScAlN films were...

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Veröffentlicht in:Applied physics letters 2024-07, Vol.125 (2)
Hauptverfasser: Maeda, Takuya, Wakamoto, Yusuke, Kaneki, Shota, Fujikura, Hajime, Kobayashi, Atsushi
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Wakamoto, Yusuke
Kaneki, Shota
Fujikura, Hajime
Kobayashi, Atsushi
description Three scandium aluminum nitride (ScAlN) thin films with different Sc compositions of 6%, 10%, and 14% were heteroepitaxially grown on n-type GaN bulk substrates by a low-temperature sputtering method. Atomically flat and smooth surfaces were observed by atomic force microscopy. The ScAlN films were coherently grown on GaN, and the c-axis lattice constants increased with increase in the Sc composition, confirmed by x-ray diffraction. The refractive index and the extinction coefficient of ScAlN were extracted by variable angle spectroscopic ellipsometry. The refractive index slightly increased and the extinction coefficient showed red shift with increase in the Sc composition. The optical bandgap of the ScAlN films was also extracted, which slightly shrunk with increase in the Sc composition.
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subjects Composition
Doppler effect
Epitaxial growth
Gallium nitrides
Lattice parameters
Low temperature
Optical properties
Red shift
Refractivity
Scandium
Spectroellipsometry
Sputtering
Substrates
Thin films
title Structural and optical properties of epitaxial ScxAl1−xN coherently grown on GaN bulk substrates by sputtering method
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