Direct-write projection lithography of quantum dot micropillar single photon sources

We have developed a process to mass-produce quantum dot micropillar cavities using direct-write lithography. This technique allows us to achieve mass patterning of high-aspect ratio pillars with vertical, smooth sidewalls maintaining a high quality factor for diameters below 2.0 μm. Encapsulating th...

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Veröffentlicht in:Applied physics letters 2023-08, Vol.123 (9)
Hauptverfasser: Androvitsaneas, Petros, Clark, Rachel N., Jordan, Matthew, Alvarez Perez, Miguel, Peach, Tomas, Thomas, Stuart, Shabbir, Saleem, Sobiesierski, Angela D., Trapalis, Aristotelis, Farrer, Ian A., Langbein, Wolfgang W., Bennett, Anthony J.
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container_issue 9
container_start_page
container_title Applied physics letters
container_volume 123
creator Androvitsaneas, Petros
Clark, Rachel N.
Jordan, Matthew
Alvarez Perez, Miguel
Peach, Tomas
Thomas, Stuart
Shabbir, Saleem
Sobiesierski, Angela D.
Trapalis, Aristotelis
Farrer, Ian A.
Langbein, Wolfgang W.
Bennett, Anthony J.
description We have developed a process to mass-produce quantum dot micropillar cavities using direct-write lithography. This technique allows us to achieve mass patterning of high-aspect ratio pillars with vertical, smooth sidewalls maintaining a high quality factor for diameters below 2.0 μm. Encapsulating the cavities in a thin layer of oxide (Ta2O5) prevents oxidation in the atmosphere, preserving the optical properties of the cavity over months of ambient exposure. We confirm that single dots in the cavities can be deterministically excited to create high-purity indistinguishable single photons with interference visibility ( 0.941   ±   0.008 ).
doi_str_mv 10.1063/5.0155968
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source AIP Journals Complete; Alma/SFX Local Collection
subjects Applied physics
Aspect ratio
Holes
Lithography
Optical properties
Oxidation
Photons
Quantum dots
Tantalum
Tantalum oxides
title Direct-write projection lithography of quantum dot micropillar single photon sources
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