Prediction of glassy silica etching with hydrogen fluoride gas by kinetic Monte Carlo simulations

Understanding the surface properties of glass during the hydrogen fluoride (HF)-based vapor etching process is essential to optimize treatment processes in semiconductor and glass industries. In this work, we investigate an etching process of fused glassy silica by HF gas with kinetic Monte Carlo (K...

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Veröffentlicht in:	The Journal of chemical physics 2023-03, Vol.158 (9), p.094709-094709
Hauptverfasser:	Park, Hyunhang, Antony, Andrew C., Banerjee, Joy, Smith, Nicholas J., Agnello, Gabriel
Format:	Artikel
Sprache:	eng
Schlagworte:	Algorithms Computer simulation Etching Evolution Fluorides Fluorine Hydrogen fluoride Hydroxyl groups Moisture effects Roughening Silica glass Silicon dioxide Surface properties Surface reactions Surface roughness
Online-Zugang:	Volltext
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