Effect of cetyltrimethylammonium bromide on hydrophobicity of silica thin layer and xerogel derived from sodium silicate and methyltrimethoxysilane
Hydrophobic silica thin films are produced from sodium silicate and methyltrimethoxysilane (MTMS). CTAB has a hydrophobic group that can increase its hydrophobicity. The purpose of this study was to examine the effect of adding CTAB to silica thin film and xerogel with sodium silicate and MTMS as a...
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| creator | Maghfiroh, Riza Fithrotul Azmiyawati, Choiril Darmawan, Adi |
| description | Hydrophobic silica thin films are produced from sodium silicate and methyltrimethoxysilane (MTMS). CTAB has a hydrophobic group that can increase its hydrophobicity. The purpose of this study was to examine the effect of adding CTAB to silica thin film and xerogel with sodium silicate and MTMS as a precursor. Thin film and xerogel were obtained using the sol-gel and dip-coating methods. The results showed that the addition of CTAB affected the hydrophobic properties of the thin film and xerogel samples. The more CTAB added, the greater the water contact angle, with a limit for adding CTAB of 0.064 g. The water contact angle was obtained for the highest addition of CTAB, with values of 91°, 105.4°, and 107.1° respectively for thin films, non-calcined xerogel, and calcined xerogel. The FTIR results showed that in the calcined and non-calcined xerogel samples, the Si-OH/Si-O-Si ratio tended to decrease. |
| doi_str_mv | 10.1063/5.0104042 |
| format | Conference Proceeding |
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CTAB has a hydrophobic group that can increase its hydrophobicity. The purpose of this study was to examine the effect of adding CTAB to silica thin film and xerogel with sodium silicate and MTMS as a precursor. Thin film and xerogel were obtained using the sol-gel and dip-coating methods. The results showed that the addition of CTAB affected the hydrophobic properties of the thin film and xerogel samples. The more CTAB added, the greater the water contact angle, with a limit for adding CTAB of 0.064 g. The water contact angle was obtained for the highest addition of CTAB, with values of 91°, 105.4°, and 107.1° respectively for thin films, non-calcined xerogel, and calcined xerogel. The FTIR results showed that in the calcined and non-calcined xerogel samples, the Si-OH/Si-O-Si ratio tended to decrease.</description><identifier>ISSN: 0094-243X</identifier><identifier>EISSN: 1551-7616</identifier><identifier>DOI: 10.1063/5.0104042</identifier><identifier>CODEN: APCPCS</identifier><language>eng</language><publisher>Melville: American Institute of Physics</publisher><subject>Cetyltrimethylammonium bromide ; Contact angle ; Dip coatings ; Hydrophobicity ; Immersion coating ; Roasting ; Silicon dioxide ; Sodium silicates ; Sol-gel processes ; Thin films ; Xerogels</subject><ispartof>AIP conference proceedings, 2022, Vol.2553 (1)</ispartof><rights>Author(s)</rights><rights>2022 Author(s). Published by AIP Publishing.</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://pubs.aip.org/acp/article-lookup/doi/10.1063/5.0104042$$EHTML$$P50$$Gscitation$$H</linktohtml><link.rule.ids>309,310,314,776,780,785,786,790,4498,23909,23910,25118,27901,27902,76127</link.rule.ids></links><search><contributor>Qasmi, Zaheer Ul-Haq</contributor><contributor>Limbut, Warakorn</contributor><contributor>Aboul-Enein, Hassan Y.</contributor><contributor>Abdullah, Ahmad Zuhairi</contributor><contributor>Kurniasih, Mardiyah</contributor><contributor>Sulaeman, Uyi</contributor><contributor>Subba, Jas Raj</contributor><creatorcontrib>Maghfiroh, Riza Fithrotul</creatorcontrib><creatorcontrib>Azmiyawati, Choiril</creatorcontrib><creatorcontrib>Darmawan, Adi</creatorcontrib><title>Effect of cetyltrimethylammonium bromide on hydrophobicity of silica thin layer and xerogel derived from sodium silicate and methyltrimethoxysilane</title><title>AIP conference proceedings</title><description>Hydrophobic silica thin films are produced from sodium silicate and methyltrimethoxysilane (MTMS). CTAB has a hydrophobic group that can increase its hydrophobicity. The purpose of this study was to examine the effect of adding CTAB to silica thin film and xerogel with sodium silicate and MTMS as a precursor. Thin film and xerogel were obtained using the sol-gel and dip-coating methods. The results showed that the addition of CTAB affected the hydrophobic properties of the thin film and xerogel samples. The more CTAB added, the greater the water contact angle, with a limit for adding CTAB of 0.064 g. The water contact angle was obtained for the highest addition of CTAB, with values of 91°, 105.4°, and 107.1° respectively for thin films, non-calcined xerogel, and calcined xerogel. The FTIR results showed that in the calcined and non-calcined xerogel samples, the Si-OH/Si-O-Si ratio tended to decrease.</description><subject>Cetyltrimethylammonium bromide</subject><subject>Contact angle</subject><subject>Dip coatings</subject><subject>Hydrophobicity</subject><subject>Immersion coating</subject><subject>Roasting</subject><subject>Silicon dioxide</subject><subject>Sodium silicates</subject><subject>Sol-gel processes</subject><subject>Thin films</subject><subject>Xerogels</subject><issn>0094-243X</issn><issn>1551-7616</issn><fulltext>true</fulltext><rsrctype>conference_proceeding</rsrctype><creationdate>2022</creationdate><recordtype>conference_proceeding</recordtype><recordid>eNotkM1OwzAQhC0EEqVw4A0scUNKsR3Hdo6oKj9SJS4gcYscZ01cJXFwXNQ8By9MSnraw3wzs7sI3VKyokSkD9mKUMIJZ2doQbOMJlJQcY4WhOQ8YTz9vERXw7AjhOVSqgX63VgLJmJvsYE4NjG4FmI9Nrptfef2LS6Db10F2He4Hqvg-9qXzrg4Hj2Da5zRONauw40eIWDdVfgAwX9BgysI7gcqbKcIPPjqGDc7IvyDc9Wp0x_GSdQdXKMLq5sBbk5ziT6eNu_rl2T79vy6ftwmPRWKJVoA0DKDVElmmMhK4IpbasAIU-UyZwA2I6VUVpRKlymzJJs0mROmS8V1ukR3c24f_Pcehljs_D50U2XBZKomUnE-UfczNUxH6-h8V_TTwjqMBSXF8elFVpyenv4BtlR4ug</recordid><startdate>20221122</startdate><enddate>20221122</enddate><creator>Maghfiroh, Riza Fithrotul</creator><creator>Azmiyawati, Choiril</creator><creator>Darmawan, Adi</creator><general>American Institute of Physics</general><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope></search><sort><creationdate>20221122</creationdate><title>Effect of cetyltrimethylammonium bromide on hydrophobicity of silica thin layer and xerogel derived from sodium silicate and methyltrimethoxysilane</title><author>Maghfiroh, Riza Fithrotul ; Azmiyawati, Choiril ; Darmawan, Adi</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-p1682-a6ee1b5e3872c265be484f1cec6cd9792eef50b78f6b8ab32f05ec67902ab84a3</frbrgroupid><rsrctype>conference_proceedings</rsrctype><prefilter>conference_proceedings</prefilter><language>eng</language><creationdate>2022</creationdate><topic>Cetyltrimethylammonium bromide</topic><topic>Contact angle</topic><topic>Dip coatings</topic><topic>Hydrophobicity</topic><topic>Immersion coating</topic><topic>Roasting</topic><topic>Silicon dioxide</topic><topic>Sodium silicates</topic><topic>Sol-gel processes</topic><topic>Thin films</topic><topic>Xerogels</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Maghfiroh, Riza Fithrotul</creatorcontrib><creatorcontrib>Azmiyawati, Choiril</creatorcontrib><creatorcontrib>Darmawan, Adi</creatorcontrib><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Maghfiroh, Riza Fithrotul</au><au>Azmiyawati, Choiril</au><au>Darmawan, Adi</au><au>Qasmi, Zaheer Ul-Haq</au><au>Limbut, Warakorn</au><au>Aboul-Enein, Hassan Y.</au><au>Abdullah, Ahmad Zuhairi</au><au>Kurniasih, Mardiyah</au><au>Sulaeman, Uyi</au><au>Subba, Jas Raj</au><format>book</format><genre>proceeding</genre><ristype>CONF</ristype><atitle>Effect of cetyltrimethylammonium bromide on hydrophobicity of silica thin layer and xerogel derived from sodium silicate and methyltrimethoxysilane</atitle><btitle>AIP conference proceedings</btitle><date>2022-11-22</date><risdate>2022</risdate><volume>2553</volume><issue>1</issue><issn>0094-243X</issn><eissn>1551-7616</eissn><coden>APCPCS</coden><abstract>Hydrophobic silica thin films are produced from sodium silicate and methyltrimethoxysilane (MTMS). CTAB has a hydrophobic group that can increase its hydrophobicity. The purpose of this study was to examine the effect of adding CTAB to silica thin film and xerogel with sodium silicate and MTMS as a precursor. Thin film and xerogel were obtained using the sol-gel and dip-coating methods. The results showed that the addition of CTAB affected the hydrophobic properties of the thin film and xerogel samples. The more CTAB added, the greater the water contact angle, with a limit for adding CTAB of 0.064 g. The water contact angle was obtained for the highest addition of CTAB, with values of 91°, 105.4°, and 107.1° respectively for thin films, non-calcined xerogel, and calcined xerogel. The FTIR results showed that in the calcined and non-calcined xerogel samples, the Si-OH/Si-O-Si ratio tended to decrease.</abstract><cop>Melville</cop><pub>American Institute of Physics</pub><doi>10.1063/5.0104042</doi><tpages>7</tpages><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0094-243X |
| ispartof | AIP conference proceedings, 2022, Vol.2553 (1) |
| issn | 0094-243X 1551-7616 |
| language | eng |
| recordid | cdi_scitation_primary_10_1063_5_0104042 |
| source | AIP Journals Complete |
| subjects | Cetyltrimethylammonium bromide Contact angle Dip coatings Hydrophobicity Immersion coating Roasting Silicon dioxide Sodium silicates Sol-gel processes Thin films Xerogels |
| title | Effect of cetyltrimethylammonium bromide on hydrophobicity of silica thin layer and xerogel derived from sodium silicate and methyltrimethoxysilane |
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