Noninvasive method to measure the electron temperature in radio frequency capacitively coupled plasmas

The electron temperature Te is a key plasma parameter in both industrial plasma processes and fundamental laboratory research. A noninvasive method to measure Te in current and next-generation semiconductor plasma processes is urgently required for fine-tuning the processing result and virtual metro...

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Veröffentlicht in:	Applied physics letters 2021-05, Vol.118 (20)
Hauptverfasser:	Lee, Hyo-Chang, Chung, C.-W., Lee, M. H., Kim, J. H.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied physics Electron energy Plasma Semiconductor plasmas Substrates
Online-Zugang:	Volltext
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