Origin of the magnetic properties of Fe-implanted 4H-SiC semiconductor

p-doped 4H-SiC substrates were implanted with 57Fe ions at energies ranging from 30 to 160 keV and subjected to a rapid thermal annealing in order to produce a homogeneous Fe concentration inside a 100 nm-thick region in the semiconducting SiC material. Using 57Fe Conversion Electron Mössbauer Spect...

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Veröffentlicht in:Journal of applied physics 2020-05, Vol.127 (18)
Hauptverfasser: Diallo, L., Fnidiki, A., Lechevallier, L., Juraszek, J., Viret, M., Marteau, M., Eyidi, D., Declémy, A.
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container_issue 18
container_start_page
container_title Journal of applied physics
container_volume 127
creator Diallo, L.
Fnidiki, A.
Lechevallier, L.
Juraszek, J.
Viret, M.
Marteau, M.
Eyidi, D.
Declémy, A.
description p-doped 4H-SiC substrates were implanted with 57Fe ions at energies ranging from 30 to 160 keV and subjected to a rapid thermal annealing in order to produce a homogeneous Fe concentration inside a 100 nm-thick region in the semiconducting SiC material. Using 57Fe Conversion Electron Mössbauer Spectrometry and Superconducting Quantum Interference Device magnetometry, we give evidence that the ferromagnetism obtained in SiC implanted with a 57Fe atoms concentration close to 2% is not only due to the formation of some Fe–Si magnetic nanoparticles but also originates from magnetic Fe atoms diluted in the matrix of the semiconductor. So, values of Fe atoms magnetizations contained in nanoparticles and Fe atoms diluted in the matrix and the Curie temperatures associated with the nanoparticles and to the matrix have been determined.
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source AIP Journals Complete; Alma/SFX Local Collection
subjects Condensed Matter
Dilution
Ferromagnetism
Iron
Iron 57
Magnetic measurement
Magnetic properties
Materials Science
Nanoparticles
Physics
Silicon carbide
Silicon substrates
Superconducting quantum interference devices
title Origin of the magnetic properties of Fe-implanted 4H-SiC semiconductor
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