Origin of the magnetic properties of Fe-implanted 4H-SiC semiconductor
p-doped 4H-SiC substrates were implanted with 57Fe ions at energies ranging from 30 to 160 keV and subjected to a rapid thermal annealing in order to produce a homogeneous Fe concentration inside a 100 nm-thick region in the semiconducting SiC material. Using 57Fe Conversion Electron Mössbauer Spect...
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creator | Diallo, L. Fnidiki, A. Lechevallier, L. Juraszek, J. Viret, M. Marteau, M. Eyidi, D. Declémy, A. |
description | p-doped 4H-SiC substrates were implanted with 57Fe ions at energies ranging from 30 to 160 keV and subjected to a rapid thermal annealing in order to produce a homogeneous Fe concentration inside a 100 nm-thick region in the semiconducting SiC material. Using 57Fe Conversion Electron Mössbauer Spectrometry and Superconducting Quantum Interference Device magnetometry, we give evidence that the ferromagnetism obtained in SiC implanted with a 57Fe atoms concentration close to 2% is not only due to the formation of some Fe–Si magnetic nanoparticles but also originates from magnetic Fe atoms diluted in the matrix of the semiconductor. So, values of Fe atoms magnetizations contained in nanoparticles and Fe atoms diluted in the matrix and the Curie temperatures associated with the nanoparticles and to the matrix have been determined. |
doi_str_mv | 10.1063/5.0005061 |
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Using 57Fe Conversion Electron Mössbauer Spectrometry and Superconducting Quantum Interference Device magnetometry, we give evidence that the ferromagnetism obtained in SiC implanted with a 57Fe atoms concentration close to 2% is not only due to the formation of some Fe–Si magnetic nanoparticles but also originates from magnetic Fe atoms diluted in the matrix of the semiconductor. So, values of Fe atoms magnetizations contained in nanoparticles and Fe atoms diluted in the matrix and the Curie temperatures associated with the nanoparticles and to the matrix have been determined.</description><identifier>ISSN: 0021-8979</identifier><identifier>EISSN: 1089-7550</identifier><identifier>DOI: 10.1063/5.0005061</identifier><identifier>CODEN: JAPIAU</identifier><language>eng</language><publisher>Melville: American Institute of Physics</publisher><subject>Condensed Matter ; Dilution ; Ferromagnetism ; Iron ; Iron 57 ; Magnetic measurement ; Magnetic properties ; Materials Science ; Nanoparticles ; Physics ; Silicon carbide ; Silicon substrates ; Superconducting quantum interference devices</subject><ispartof>Journal of applied physics, 2020-05, Vol.127 (18)</ispartof><rights>Author(s)</rights><rights>2020 Author(s). 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Using 57Fe Conversion Electron Mössbauer Spectrometry and Superconducting Quantum Interference Device magnetometry, we give evidence that the ferromagnetism obtained in SiC implanted with a 57Fe atoms concentration close to 2% is not only due to the formation of some Fe–Si magnetic nanoparticles but also originates from magnetic Fe atoms diluted in the matrix of the semiconductor. So, values of Fe atoms magnetizations contained in nanoparticles and Fe atoms diluted in the matrix and the Curie temperatures associated with the nanoparticles and to the matrix have been determined.</description><subject>Condensed Matter</subject><subject>Dilution</subject><subject>Ferromagnetism</subject><subject>Iron</subject><subject>Iron 57</subject><subject>Magnetic measurement</subject><subject>Magnetic properties</subject><subject>Materials Science</subject><subject>Nanoparticles</subject><subject>Physics</subject><subject>Silicon carbide</subject><subject>Silicon substrates</subject><subject>Superconducting quantum interference devices</subject><issn>0021-8979</issn><issn>1089-7550</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><recordid>eNp9kEFLwzAUx4MoOKcHv0HBk0LnS9OkzXEM54TBDuo5pGmyZaxNTbKB396WjXkQPD34vx8_3vsjdI9hgoGRZzoBAAoMX6ARhpKnBaVwiUYAGU5LXvBrdBPCFgDjkvARmq-8Xds2cSaJG500ct3qaFXSeddpH60Ow2quU9t0O9lGXSf5In23syToxirX1nsVnb9FV0bugr47zTH6nL98zBbpcvX6NpsuU0UYjmmBZVWpitNaGsMq3ofM8NxwlUnDGFZGkkpljFaYlAwqmWvgBIgxmFNZEjJGj0fvRu5E520j_bdw0orFdCmGDDLK-jfxAffsw5Htf_na6xDF1u19258nshyGBjJe_BqVdyF4bc5aDGKoVFBxqrRnn45sUDbKaF17hg_O_4Kiq81_8F_zDwx7goI</recordid><startdate>20200514</startdate><enddate>20200514</enddate><creator>Diallo, L.</creator><creator>Fnidiki, A.</creator><creator>Lechevallier, L.</creator><creator>Juraszek, J.</creator><creator>Viret, M.</creator><creator>Marteau, M.</creator><creator>Eyidi, D.</creator><creator>Declémy, A.</creator><general>American Institute of Physics</general><scope>AAYXX</scope><scope>CITATION</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope><scope>1XC</scope><scope>VOOES</scope><orcidid>https://orcid.org/0000-0001-5607-0188</orcidid><orcidid>https://orcid.org/0000-0001-9525-1950</orcidid><orcidid>https://orcid.org/0000-0001-5736-425X</orcidid><orcidid>https://orcid.org/0000-0001-6320-6100</orcidid><orcidid>https://orcid.org/0000-0001-9602-7678</orcidid><orcidid>https://orcid.org/0000-0002-7434-2420</orcidid></search><sort><creationdate>20200514</creationdate><title>Origin of the magnetic properties of Fe-implanted 4H-SiC semiconductor</title><author>Diallo, L. ; Fnidiki, A. ; Lechevallier, L. ; Juraszek, J. ; Viret, M. ; Marteau, M. ; Eyidi, D. ; Declémy, A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c361t-71abbcb95daff6b93616f94f9c2af661cfa3bc265b13860ba4e09303ff195a833</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><topic>Condensed Matter</topic><topic>Dilution</topic><topic>Ferromagnetism</topic><topic>Iron</topic><topic>Iron 57</topic><topic>Magnetic measurement</topic><topic>Magnetic properties</topic><topic>Materials Science</topic><topic>Nanoparticles</topic><topic>Physics</topic><topic>Silicon carbide</topic><topic>Silicon substrates</topic><topic>Superconducting quantum interference devices</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Diallo, L.</creatorcontrib><creatorcontrib>Fnidiki, A.</creatorcontrib><creatorcontrib>Lechevallier, L.</creatorcontrib><creatorcontrib>Juraszek, J.</creatorcontrib><creatorcontrib>Viret, M.</creatorcontrib><creatorcontrib>Marteau, M.</creatorcontrib><creatorcontrib>Eyidi, D.</creatorcontrib><creatorcontrib>Declémy, A.</creatorcontrib><collection>CrossRef</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Hyper Article en Ligne (HAL)</collection><collection>Hyper Article en Ligne (HAL) (Open Access)</collection><jtitle>Journal of applied physics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Diallo, L.</au><au>Fnidiki, A.</au><au>Lechevallier, L.</au><au>Juraszek, J.</au><au>Viret, M.</au><au>Marteau, M.</au><au>Eyidi, D.</au><au>Declémy, A.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Origin of the magnetic properties of Fe-implanted 4H-SiC semiconductor</atitle><jtitle>Journal of applied physics</jtitle><date>2020-05-14</date><risdate>2020</risdate><volume>127</volume><issue>18</issue><issn>0021-8979</issn><eissn>1089-7550</eissn><coden>JAPIAU</coden><abstract>p-doped 4H-SiC substrates were implanted with 57Fe ions at energies ranging from 30 to 160 keV and subjected to a rapid thermal annealing in order to produce a homogeneous Fe concentration inside a 100 nm-thick region in the semiconducting SiC material. 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subjects | Condensed Matter Dilution Ferromagnetism Iron Iron 57 Magnetic measurement Magnetic properties Materials Science Nanoparticles Physics Silicon carbide Silicon substrates Superconducting quantum interference devices |
title | Origin of the magnetic properties of Fe-implanted 4H-SiC semiconductor |
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