Characterization of homemade UV-LED photolithography to realize high aspect ratio channels
The ultraviolet light-emitting diode (UV-LED) photolithography has been developed since the last decade. This technology has been massively used to a microfluidic device. Generally, a complex instrument needs to be installed to fabricate such desired microfluidic devices. However, it would be an int...
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| creator | Rizqika, Rayzi Whulanza, Yudan Charmet, Jerome Kiswanto, Gandjar Soemardi, Tresna P. |
| description | The ultraviolet light-emitting diode (UV-LED) photolithography has been developed since the last decade. This technology has been massively used to a microfluidic device. Generally, a complex instrument needs to be installed to fabricate such desired microfluidic devices. However, it would be an intensive investment to do so. Therefore, a low-cost photolithography is preferably compared to that conventional system that expensive and requires additional infrastructures. Here, we reported the result of our homemade UV-LED photolithography in realizing microfeature as we desired. However, a series of experiments are needed to find the optimum process parameter to have the best result. Moreover, our system achieves a 3D feature with 40-240 um thick, 40-140 um channel width, and aspect ratio until 3.5. These findings shall meet the requirement of various microfluidic applications. |
| doi_str_mv | 10.1063/5.0000873 |
| format | Conference Proceeding |
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This technology has been massively used to a microfluidic device. Generally, a complex instrument needs to be installed to fabricate such desired microfluidic devices. However, it would be an intensive investment to do so. Therefore, a low-cost photolithography is preferably compared to that conventional system that expensive and requires additional infrastructures. Here, we reported the result of our homemade UV-LED photolithography in realizing microfeature as we desired. However, a series of experiments are needed to find the optimum process parameter to have the best result. Moreover, our system achieves a 3D feature with 40-240 um thick, 40-140 um channel width, and aspect ratio until 3.5. 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| fulltext | fulltext |
| identifier | ISSN: 0094-243X |
| ispartof | AIP conference proceedings, 2020, Vol.2227 (1) |
| issn | 0094-243X 1551-7616 |
| language | eng |
| recordid | cdi_scitation_primary_10_1063_5_0000873 |
| source | AIP Journals Complete |
| subjects | High aspect ratio Light emitting diodes Microfluidic devices Photolithography Process parameters Ultraviolet radiation |
| title | Characterization of homemade UV-LED photolithography to realize high aspect ratio channels |
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