Characterization of homemade UV-LED photolithography to realize high aspect ratio channels

The ultraviolet light-emitting diode (UV-LED) photolithography has been developed since the last decade. This technology has been massively used to a microfluidic device. Generally, a complex instrument needs to be installed to fabricate such desired microfluidic devices. However, it would be an intensive investment to do so. Therefore, a low-cost photolithography is preferably compared to that conventional system that expensive and requires additional infrastructures. Here, we reported the result of our homemade UV-LED photolithography in realizing microfeature as we desired. However, a series of experiments are needed to find the optimum process parameter to have the best result. Moreover, our system achieves a 3D feature with 40-240 um thick, 40-140 um channel width, and aspect ratio until 3.5. These findings shall meet the requirement of various microfluidic applications.