Bubble-free patterning with low line edge roughness by ultraviolet nanoimprinting using trans-1,3,3,3-tetrafluoropropene condensable gas

Ultraviolet nanoimprint lithography (UV-NIL) in pentafluoropropane (PFP) is recognized as one of the most promising methods to achieve ultrahigh-speed UV-NIL without air bubble defects. Although liquefied PFP dissolved in the resin reduces the resin viscosity and demolding force, it also causes larg...

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Veröffentlicht in:	Applied physics letters 2016-10, Vol.109 (14)
Hauptverfasser:	Suzuki, Kenta, Youn, Sung-Won, Hiroshima, Hiroshi
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied physics Bubbles Nanotechnology Patterning Shrinkage Vapor pressure
Online-Zugang:	Volltext
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