SnTe microcrystals: Surface cleaning of a topological crystalline insulator
Investigating nanometer and micron sized materials thought to exhibit topological surface properties that can present a challenge, as clean surfaces are a pre-requisite for band structure measurements when using nano-ARPES or laser-ARPES in ultra-high vacuum. This issue is exacerbated when dealing w...
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Veröffentlicht in: | Applied physics letters 2016-02, Vol.108 (6) |
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creator | Saghir, M. Walker, M. McConville, C. F. Balakrishnan, G. |
description | Investigating nanometer and micron sized materials thought to exhibit topological surface properties that can present a challenge, as clean surfaces are a pre-requisite for band structure measurements when using nano-ARPES or laser-ARPES in ultra-high vacuum. This issue is exacerbated when dealing with nanometer or micron sized materials, which have been prepared ex-situ and so have been exposed to atmosphere. We present the findings of an XPS study where various cleaning methods have been employed to reduce the surface contamination and preserve the surface quality for surface sensitive measurements. Microcrystals of the topological crystalline insulator SnTe were grown ex-situ and transferred into ultra high vacuum (UHV) before being treated with either atomic hydrogen, argon sputtering, annealing, or a combination of treatments. The samples were also characterised using the scanning electron microscopy, both before and after treatment. It was found that atomic hydrogen cleaning with an anneal cycle (200 °C) gave the best clean surface results. |
doi_str_mv | 10.1063/1.4941234 |
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The samples were also characterised using the scanning electron microscopy, both before and after treatment. It was found that atomic hydrogen cleaning with an anneal cycle (200 °C) gave the best clean surface results.</description><identifier>ISSN: 0003-6951</identifier><identifier>EISSN: 1077-3118</identifier><identifier>DOI: 10.1063/1.4941234</identifier><identifier>CODEN: APPLAB</identifier><language>eng</language><publisher>Melville: American Institute of Physics</publisher><subject>ANNEALING ; Applied physics ; ARGON ; CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS ; Cleaning ; Crystal structure ; Crystallinity ; CRYSTALS ; High vacuum ; HYDROGEN ; LASERS ; MATERIALS ; Microcrystals ; SCANNING ELECTRON MICROSCOPY ; SPUTTERING ; SURFACE CLEANING ; SURFACE PROPERTIES ; SURFACES ; TIN TELLURIDES ; TOPOLOGY ; X-RAY PHOTOELECTRON SPECTROSCOPY</subject><ispartof>Applied physics letters, 2016-02, Vol.108 (6)</ispartof><rights>AIP Publishing LLC</rights><rights>2016 AIP Publishing LLC.</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c390t-fbab0ff8731f3188364159a56f8d14c81e8949bc3bc60df673aaf6d6284561c93</citedby><cites>FETCH-LOGICAL-c390t-fbab0ff8731f3188364159a56f8d14c81e8949bc3bc60df673aaf6d6284561c93</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://pubs.aip.org/apl/article-lookup/doi/10.1063/1.4941234$$EHTML$$P50$$Gscitation$$H</linktohtml><link.rule.ids>230,314,776,780,790,881,4498,27901,27902,76127</link.rule.ids><backlink>$$Uhttps://www.osti.gov/biblio/22489433$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Saghir, M.</creatorcontrib><creatorcontrib>Walker, M.</creatorcontrib><creatorcontrib>McConville, C. F.</creatorcontrib><creatorcontrib>Balakrishnan, G.</creatorcontrib><title>SnTe microcrystals: Surface cleaning of a topological crystalline insulator</title><title>Applied physics letters</title><description>Investigating nanometer and micron sized materials thought to exhibit topological surface properties that can present a challenge, as clean surfaces are a pre-requisite for band structure measurements when using nano-ARPES or laser-ARPES in ultra-high vacuum. This issue is exacerbated when dealing with nanometer or micron sized materials, which have been prepared ex-situ and so have been exposed to atmosphere. We present the findings of an XPS study where various cleaning methods have been employed to reduce the surface contamination and preserve the surface quality for surface sensitive measurements. Microcrystals of the topological crystalline insulator SnTe were grown ex-situ and transferred into ultra high vacuum (UHV) before being treated with either atomic hydrogen, argon sputtering, annealing, or a combination of treatments. The samples were also characterised using the scanning electron microscopy, both before and after treatment. It was found that atomic hydrogen cleaning with an anneal cycle (200 °C) gave the best clean surface results.</description><subject>ANNEALING</subject><subject>Applied physics</subject><subject>ARGON</subject><subject>CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS</subject><subject>Cleaning</subject><subject>Crystal structure</subject><subject>Crystallinity</subject><subject>CRYSTALS</subject><subject>High vacuum</subject><subject>HYDROGEN</subject><subject>LASERS</subject><subject>MATERIALS</subject><subject>Microcrystals</subject><subject>SCANNING ELECTRON MICROSCOPY</subject><subject>SPUTTERING</subject><subject>SURFACE CLEANING</subject><subject>SURFACE PROPERTIES</subject><subject>SURFACES</subject><subject>TIN TELLURIDES</subject><subject>TOPOLOGY</subject><subject>X-RAY PHOTOELECTRON SPECTROSCOPY</subject><issn>0003-6951</issn><issn>1077-3118</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2016</creationdate><recordtype>article</recordtype><recordid>eNp90E1LwzAYB_AgCs7pwW8Q8KRQzdO0WepNhm848LB5DmmazIwuqUkq7NvbseEOgqeHB37PC3-ELoHcAmH0Dm6LqoCcFkdoBGQyySgAP0YjQgjNWFXCKTqLcTW0ZU7pCL3N3ULjtVXBq7CJSbbxHs_7YKTSWLVaOuuW2BsscfKdb_3SKtnivW2t09i62Lcy-XCOTswwry_2dYw-nh4X05ds9v78On2YZYpWJGWmljUxhk8oGAqcU1ZAWcmSGd5AoThoXhVVrWitGGkMm1ApDWtYzouSgaroGF3t9vqYrIjKJq0-lXdOqyTyvBjGKT2oLvivXsckVr4PbnhM5JAPdyvCy0Fd79QQQIxBG9EFu5ZhI4CIbaICxD7Rwd7s7PakTNa7X_ztwwGKrjH_4b-bfwD06INP</recordid><startdate>20160208</startdate><enddate>20160208</enddate><creator>Saghir, M.</creator><creator>Walker, M.</creator><creator>McConville, C. F.</creator><creator>Balakrishnan, G.</creator><general>American Institute of Physics</general><scope>AAYXX</scope><scope>CITATION</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope><scope>OTOTI</scope></search><sort><creationdate>20160208</creationdate><title>SnTe microcrystals: Surface cleaning of a topological crystalline insulator</title><author>Saghir, M. ; Walker, M. ; McConville, C. 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F.</creatorcontrib><creatorcontrib>Balakrishnan, G.</creatorcontrib><collection>CrossRef</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>OSTI.GOV</collection><jtitle>Applied physics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Saghir, M.</au><au>Walker, M.</au><au>McConville, C. F.</au><au>Balakrishnan, G.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>SnTe microcrystals: Surface cleaning of a topological crystalline insulator</atitle><jtitle>Applied physics letters</jtitle><date>2016-02-08</date><risdate>2016</risdate><volume>108</volume><issue>6</issue><issn>0003-6951</issn><eissn>1077-3118</eissn><coden>APPLAB</coden><abstract>Investigating nanometer and micron sized materials thought to exhibit topological surface properties that can present a challenge, as clean surfaces are a pre-requisite for band structure measurements when using nano-ARPES or laser-ARPES in ultra-high vacuum. This issue is exacerbated when dealing with nanometer or micron sized materials, which have been prepared ex-situ and so have been exposed to atmosphere. We present the findings of an XPS study where various cleaning methods have been employed to reduce the surface contamination and preserve the surface quality for surface sensitive measurements. Microcrystals of the topological crystalline insulator SnTe were grown ex-situ and transferred into ultra high vacuum (UHV) before being treated with either atomic hydrogen, argon sputtering, annealing, or a combination of treatments. The samples were also characterised using the scanning electron microscopy, both before and after treatment. It was found that atomic hydrogen cleaning with an anneal cycle (200 °C) gave the best clean surface results.</abstract><cop>Melville</cop><pub>American Institute of Physics</pub><doi>10.1063/1.4941234</doi><tpages>4</tpages><oa>free_for_read</oa></addata></record> |
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subjects | ANNEALING Applied physics ARGON CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS Cleaning Crystal structure Crystallinity CRYSTALS High vacuum HYDROGEN LASERS MATERIALS Microcrystals SCANNING ELECTRON MICROSCOPY SPUTTERING SURFACE CLEANING SURFACE PROPERTIES SURFACES TIN TELLURIDES TOPOLOGY X-RAY PHOTOELECTRON SPECTROSCOPY |
title | SnTe microcrystals: Surface cleaning of a topological crystalline insulator |
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