Electronic transport in heavily doped Ag/n-Si composite films
Hall measurements characterized Ag/n-Si composite films 1 micron thick produced by magnetron co-sputtering onto high resistivity Si (111) substrates at 550°C. The targets were Ag and n-type Si doped with 3 × 1019/cm3 of antimony. Films were prepared with 13, 16 and 22 at. % Ag and measured over a te...
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Veröffentlicht in: | AIP advances 2013-10, Vol.3 (10), p.102111-102111-15 |
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