Effect of magnetic field profile on the uniformity of a distributed electron cyclotron resonance plasma
This study extensively measured the uniformity of an electron cyclotron resonance (ECR) plasma versus the magnetic field distribution. The influence of magnetic field distribution on the generation of uniform ECR plasma was examined. It is suggested that in addition to the uniformity of the magnetic...
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| Veröffentlicht in: | Physics of plasmas 2013-07, Vol.20 (7), p.73504 |
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| container_start_page | 73504 |
| container_title | Physics of plasmas |
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| creator | Huang, C. C. Chou, S. F. Chang, T. H. Chao, H. W. Chen, C. C. |
| description | This study extensively measured the uniformity of an electron cyclotron resonance (ECR) plasma versus the magnetic field distribution. The influence of magnetic field distribution on the generation of uniform ECR plasma was examined. It is suggested that in addition to the uniformity of the magnetic field distribution at ECR zone and at the downstream zone near the substrate, the transition of the magnetic field between these two zones is also crucial. A uniform ECR plasma with the electron density uniformity of ±7.7% over 500 × 500 mm2 was measured at the downstream. The idea of generating uniform ECR plasma can be scaled up to a much larger area by using an n × n microwave input array and a well-designed magnetic system. |
| doi_str_mv | 10.1063/1.4813788 |
| format | Article |
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The idea of generating uniform ECR plasma can be scaled up to a much larger area by using an n × n microwave input array and a well-designed magnetic system.</description><subject>70 PLASMA PHYSICS AND FUSION TECHNOLOGY</subject><subject>ECR HEATING</subject><subject>ELECTRON CYCLOTRON-RESONANCE</subject><subject>ELECTRON DENSITY</subject><subject>MAGNETIC FIELD CONFIGURATIONS</subject><subject>MAGNETIC FIELDS</subject><subject>MICROWAVE RADIATION</subject><subject>PLASMA DENSITY</subject><subject>RF SYSTEMS</subject><subject>SUBSTRATES</subject><issn>1070-664X</issn><issn>1089-7674</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2013</creationdate><recordtype>article</recordtype><recordid>eNp90E1LxDAQBuAgCq6rB_9BwJNC16Rpm_Qoy_oBC14UvIV0muxG2qQkWWH_va0rehCcy8zh4WV4EbqkZEFJxW7pohCUcSGO0IwSUWe84sXxdHOSVVXxdorOYnwnhBRVKWZoszJGQ8Le4F5tnE4WsLG6a_EQvLGdxt7htNV456zxobdpP1mFWxtTsM0u6RbrbowII4Q9dP7rCjp6pxxoPHQq9uocnRjVRX3xvefo9X71snzM1s8PT8u7dQYs5yljtKxbxYGAbkShW9II0uS1IQ1wLoAxqAsFVQ28NCUI0KrkyuRMG2jy0gg2R1eHXB-TlRFs0rAF79z4oczH4bUoR3V9UBB8jEEbOQTbq7CXlMipR0nld4-jvTnYKUwl690P_vDhF8qhNf_hv8mfm72Dog</recordid><startdate>20130701</startdate><enddate>20130701</enddate><creator>Huang, C. 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| ispartof | Physics of plasmas, 2013-07, Vol.20 (7), p.73504 |
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| language | eng |
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| source | AIP Journals Complete; AIP Digital Archive; Alma/SFX Local Collection |
| subjects | 70 PLASMA PHYSICS AND FUSION TECHNOLOGY ECR HEATING ELECTRON CYCLOTRON-RESONANCE ELECTRON DENSITY MAGNETIC FIELD CONFIGURATIONS MAGNETIC FIELDS MICROWAVE RADIATION PLASMA DENSITY RF SYSTEMS SUBSTRATES |
| title | Effect of magnetic field profile on the uniformity of a distributed electron cyclotron resonance plasma |
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