Coherent heteroepitaxy of Bi 2 Se 3 on GaAs (111)B

We report the heteroepitaxy of single crystal thin films of Bi 2 Se 3 on the (111)B surface of GaAs by molecular beam epitaxy. We find that Bi 2 Se 3 grows highly c-axis oriented, with an atomically sharp interface with the GaAs substrate. By optimizing the growth of a very thin GaAs buffer layer be...

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Veröffentlicht in:Applied physics letters 2010-12, Vol.97 (26), p.262104-262104-3
Hauptverfasser: Richardella, A., Zhang, D. M., Lee, J. S., Koser, A., Rench, D. W., Yeats, A. L., Buckley, B. B., Awschalom, D. D., Samarth, N.
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container_issue 26
container_start_page 262104
container_title Applied physics letters
container_volume 97
creator Richardella, A.
Zhang, D. M.
Lee, J. S.
Koser, A.
Rench, D. W.
Yeats, A. L.
Buckley, B. B.
Awschalom, D. D.
Samarth, N.
description We report the heteroepitaxy of single crystal thin films of Bi 2 Se 3 on the (111)B surface of GaAs by molecular beam epitaxy. We find that Bi 2 Se 3 grows highly c-axis oriented, with an atomically sharp interface with the GaAs substrate. By optimizing the growth of a very thin GaAs buffer layer before growing the Bi 2 Se 3 , we demonstrate the growth of thin films with atomically flat terraces over hundreds of nanometers. Initial time-resolved Kerr rotation measurements herald opportunities for probing coherent spin dynamics at the interface between a candidate topological insulator and a large class of GaAs-based heterostructures.
doi_str_mv 10.1063/1.3532845
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title Coherent heteroepitaxy of Bi 2 Se 3 on GaAs (111)B
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