Negative‐ion extraction of gaseous materials from a radio frequency plasma‐sputter‐type heavy negative‐ion source

The operational characteristics of a rf plasma‐sputter‐type heavy negative‐ion source with a feeding of O2 or SF6 gas as an ionized material together with Xe gas is presented. To obtain negative ions of chemically reactive elements, we used a material gas and a stainless‐steel sputtering target inst...

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Veröffentlicht in:	Review of Scientific Instruments 1996-03, Vol.67 (3), p.1012-1015
Hauptverfasser:	Tsuji, Hiroshi, Ishikawa, Junzo, Tomita, Tetsuo, Gotoh, Yasuhito
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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