Investigation of a 2.45 GHz ECR plasma for ion etching
Reactive ion‐stream etching of SiO2 by CF4 ECR plasma has been investigated using different magnetic configurations. Whereas a permanent multipole field yielded the best results concerning the homogeneity over a large area, the highest etching rates were achieved with a longitudinally gradient field...
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| Veröffentlicht in: | Review of Scientific Instruments 1992-04, Vol.63 (4), p.2394-2396, Article 2394 |
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| container_end_page | 2396 |
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| container_issue | 4 |
| container_start_page | 2394 |
| container_title | Review of Scientific Instruments |
| container_volume | 63 |
| creator | Eichelberger, M. Friedrich, L. Huttel, E. Wiss, L. |
| description | Reactive ion‐stream etching of SiO2 by CF4 ECR plasma has been investigated using different magnetic configurations. Whereas a permanent multipole field yielded the best results concerning the homogeneity over a large area, the highest etching rates were achieved with a longitudinally gradient field. |
| doi_str_mv | 10.1063/1.1142940 |
| format | Article |
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| identifier | ISSN: 0034-6748 |
| ispartof | Review of Scientific Instruments, 1992-04, Vol.63 (4), p.2394-2396, Article 2394 |
| issn | 0034-6748 1089-7623 |
| language | eng |
| recordid | cdi_scitation_primary_10_1063_1_1142940 |
| source | Web of Science - Science Citation Index Expanded - 1992<img src="https://exlibris-pub.s3.amazonaws.com/fromwos-v2.jpg" />; AIP Digital Archive |
| subjects | Atomic, molecular and charged-particle sources and detectors Charged-particle beam sources and detectors Exact sciences and technology Instruments & Instrumentation Instruments, apparatus, components and techniques common to several branches of physics and astronomy Physical Sciences Physics Physics, Applied Science & Technology Technology |
| title | Investigation of a 2.45 GHz ECR plasma for ion etching |
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