Plasma nitrogen fixation in the presence of a liquid interface: role of OH radicals

Physical backgrounds of a nitrogen fixation process in a nanosecond pulsed discharge in the presence of a plasma/liquid interface are reported. The role of OH radicals and O atoms in NO formation is experimentally revealed for the plasma operating in a single pulse mode and high-frequency burst. The...

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Veröffentlicht in:	Reaction chemistry & engineering 2022-05, Vol.7 (5), p.147-152
Hauptverfasser:	Gromov, Mikhail, Leonova, Kseniia, Britun, Nikolay, De Geyter, Nathalie, Morent, Rino, Snyders, Rony, Nikiforov, Anton
Format:	Artikel
Sprache:	eng
Schlagworte:	Dielectric barrier discharge Nanosecond pulses Nitrogenation Plasma Radicals
Online-Zugang:	Volltext
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