The effect of post-deposition annealing conditions on structural and thermoelectric properties of sputtered copper oxide films
The development of thin-film thermoelectric applications in sensing and energy harvesting can benefit largely from suitable deposition methods for earth-abundant materials. In this study, p-type copper oxide thin films have been prepared on soda lime silicate glass by direct current (DC) magnetron s...
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| creator | Abinaya, Chandrasekaran Bethke, Kevin Andrei, Virgil Baumann, Jonas Pollakowski-Herrmann, Beatrix Kanngießer, Birgit Beckhoff, Burkhard Vásquez, G. Cristian Mayandi, Jeyanthinath Finstad, Terje G Rademann, Klaus |
| description | The development of thin-film thermoelectric applications in sensing and energy harvesting can benefit largely from suitable deposition methods for earth-abundant materials. In this study, p-type copper oxide thin films have been prepared on soda lime silicate glass by direct current (DC) magnetron sputtering at room temperature from a pure copper metallic target in an argon atmosphere, followed by subsequent annealing steps at 300 °C under various atmospheres, namely air (CuO:air), nitrogen (CuO:N) and oxygen (CuO:O). The resultant films have been studied to understand the influence of various annealing atmospheres on the structural, spectroscopic and thermoelectric properties. X-ray diffraction (XRD) patterns of the films showed reflexes that could be assigned to those of crystalline CuO with a thin mixed Cu
(I)
Cu
(II)
oxide, which was also observed by near edge X-ray absorption fine structure spectroscopy (NEXAFS). The positive Seebeck coefficient (
S
) reached values of up to 204 μV K
−1
, confirming the p-type behavior of the films. Annealing under oxygen provided a significant improvement in the electrical conductivity up to 50 S m
−1
, resulting in a power factor of 2 μW m
−1
K
−2
. The results reveal the interplay between the intrinsic composition and the thermoelectric performance of mixed copper oxide thin films, which can be finely adjusted by simply varying the annealing atmosphere.
This study reveals the interplay between the composition and thermoelectric performance of mixed copper oxide thin films, which can be finely adjusted by varying the annealing atmosphere. |
| doi_str_mv | 10.1039/d0ra03906c |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_rsc_p</sourceid><recordid>TN_cdi_rsc_primary_d0ra03906c</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2661080464</sourcerecordid><originalsourceid>FETCH-LOGICAL-c478t-ab145520d933fb5dc8bc8089ae8b664aabe89e3cf6f3551e844b5bf41e91f08b3</originalsourceid><addsrcrecordid>eNqNks9rFTEQxxdRbKm9eFdXehFlNdlNYvYilPUnFASp55BkJ30p-5JtktV68W93Xl_7rB7EwDLLzCffTPKdqnpIyUtKuv7VSJLGSIS9U-23hImmJaK_e-t_rzrM-ZzgEpy2gt6v9jrOW0p6uV_9PF1BDc6BLXV09RxzaUbA4IuPodYhgJ58OKttDONVLteYzyUttixJT4iMdVlBWkeYUCV5W88pzpCKh7zRzPNSCiQYUWPGfB0v_Qi189M6P6juOT1lOLyOB9XX9-9Oh4_NyecPn4bjk8ay17I02lCGLZOx7zpn-GilsZLIXoM0QjCtDcgeOuuEw6tRkIwZbhyj0FNHpOkOqjdb3XkxaxgthIK9qzn5tU4_VNRe_VkJfqXO4jfVE877tkOBJ1sBm3wuPqgQk1aUSN4q_JhE4tn1ESleLJCLWvtsYZp0gLhk1QqBOJrCED36Cz2PSwr4AKplHacdYT1B6vnNkTHnBG7XLiVq4716S74cX3k_IPz49gV36I3TCMgt8B1MdNl6CBZ2GA4HFzgrbDMmjAy-6I3XQ1xCwa0v_n8r0o-2dMp2B_2eUqw__VddzaPrfgHkVeG-</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2435130490</pqid></control><display><type>article</type><title>The effect of post-deposition annealing conditions on structural and thermoelectric properties of sputtered copper oxide films</title><source>NORA - Norwegian Open Research Archives</source><source>DOAJ Directory of Open Access Journals</source><source>PubMed Central Open Access</source><source>Web of Science - Science Citation Index Expanded - 2020<img src="https://exlibris-pub.s3.amazonaws.com/fromwos-v2.jpg" /></source><source>EZB-FREE-00999 freely available EZB journals</source><source>PubMed Central</source><creator>Abinaya, Chandrasekaran ; Bethke, Kevin ; Andrei, Virgil ; Baumann, Jonas ; Pollakowski-Herrmann, Beatrix ; Kanngießer, Birgit ; Beckhoff, Burkhard ; Vásquez, G. Cristian ; Mayandi, Jeyanthinath ; Finstad, Terje G ; Rademann, Klaus</creator><creatorcontrib>Abinaya, Chandrasekaran ; Bethke, Kevin ; Andrei, Virgil ; Baumann, Jonas ; Pollakowski-Herrmann, Beatrix ; Kanngießer, Birgit ; Beckhoff, Burkhard ; Vásquez, G. Cristian ; Mayandi, Jeyanthinath ; Finstad, Terje G ; Rademann, Klaus</creatorcontrib><description>The development of thin-film thermoelectric applications in sensing and energy harvesting can benefit largely from suitable deposition methods for earth-abundant materials. In this study, p-type copper oxide thin films have been prepared on soda lime silicate glass by direct current (DC) magnetron sputtering at room temperature from a pure copper metallic target in an argon atmosphere, followed by subsequent annealing steps at 300 °C under various atmospheres, namely air (CuO:air), nitrogen (CuO:N) and oxygen (CuO:O). The resultant films have been studied to understand the influence of various annealing atmospheres on the structural, spectroscopic and thermoelectric properties. X-ray diffraction (XRD) patterns of the films showed reflexes that could be assigned to those of crystalline CuO with a thin mixed Cu
(I)
Cu
(II)
oxide, which was also observed by near edge X-ray absorption fine structure spectroscopy (NEXAFS). The positive Seebeck coefficient (
S
) reached values of up to 204 μV K
−1
, confirming the p-type behavior of the films. Annealing under oxygen provided a significant improvement in the electrical conductivity up to 50 S m
−1
, resulting in a power factor of 2 μW m
−1
K
−2
. The results reveal the interplay between the intrinsic composition and the thermoelectric performance of mixed copper oxide thin films, which can be finely adjusted by simply varying the annealing atmosphere.
This study reveals the interplay between the composition and thermoelectric performance of mixed copper oxide thin films, which can be finely adjusted by varying the annealing atmosphere.</description><identifier>ISSN: 2046-2069</identifier><identifier>EISSN: 2046-2069</identifier><identifier>DOI: 10.1039/d0ra03906c</identifier><identifier>PMID: 35521098</identifier><language>eng</language><publisher>CAMBRIDGE: Royal Soc Chemistry</publisher><subject>Annealing ; Argon ; Atmospheres ; Chemistry ; Chemistry, Multidisciplinary ; Copper ; Copper oxides ; Deposition ; Diffraction patterns ; Direct current ; Electrical resistivity ; Energy harvesting ; Fine structure ; Magnetron sputtering ; Nitrogen ; Oxide coatings ; Physical Sciences ; Power factor ; Reflexes ; Room temperature ; Science & Technology ; Seebeck effect ; Thermoelectricity ; Thin films ; X ray absorption</subject><ispartof>RSC advances, 2020-08, Vol.1 (49), p.29394-2941</ispartof><rights>This journal is © The Royal Society of Chemistry.</rights><rights>Copyright Royal Society of Chemistry 2020</rights><rights>info:eu-repo/semantics/openAccess</rights><rights>This journal is © The Royal Society of Chemistry 2020 The Royal Society of Chemistry</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>true</woscitedreferencessubscribed><woscitedreferencescount>17</woscitedreferencescount><woscitedreferencesoriginalsourcerecordid>wos000560694000040</woscitedreferencesoriginalsourcerecordid><citedby>FETCH-LOGICAL-c478t-ab145520d933fb5dc8bc8089ae8b664aabe89e3cf6f3551e844b5bf41e91f08b3</citedby><cites>FETCH-LOGICAL-c478t-ab145520d933fb5dc8bc8089ae8b664aabe89e3cf6f3551e844b5bf41e91f08b3</cites><orcidid>0000-0002-0528-8635 ; 0000-0002-3218-1681 ; 0000-0003-1293-3126 ; 0000-0002-6914-4841 ; 0000-0003-3084-3917 ; 0000-0002-1085-9527</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://www.ncbi.nlm.nih.gov/pmc/articles/PMC9055923/pdf/$$EPDF$$P50$$Gpubmedcentral$$Hfree_for_read</linktopdf><linktohtml>$$Uhttps://www.ncbi.nlm.nih.gov/pmc/articles/PMC9055923/$$EHTML$$P50$$Gpubmedcentral$$Hfree_for_read</linktohtml><link.rule.ids>230,315,728,781,785,865,886,2115,26571,27928,27929,28252,53795,53797</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/35521098$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Abinaya, Chandrasekaran</creatorcontrib><creatorcontrib>Bethke, Kevin</creatorcontrib><creatorcontrib>Andrei, Virgil</creatorcontrib><creatorcontrib>Baumann, Jonas</creatorcontrib><creatorcontrib>Pollakowski-Herrmann, Beatrix</creatorcontrib><creatorcontrib>Kanngießer, Birgit</creatorcontrib><creatorcontrib>Beckhoff, Burkhard</creatorcontrib><creatorcontrib>Vásquez, G. Cristian</creatorcontrib><creatorcontrib>Mayandi, Jeyanthinath</creatorcontrib><creatorcontrib>Finstad, Terje G</creatorcontrib><creatorcontrib>Rademann, Klaus</creatorcontrib><title>The effect of post-deposition annealing conditions on structural and thermoelectric properties of sputtered copper oxide films</title><title>RSC advances</title><addtitle>RSC ADV</addtitle><addtitle>RSC Adv</addtitle><description>The development of thin-film thermoelectric applications in sensing and energy harvesting can benefit largely from suitable deposition methods for earth-abundant materials. In this study, p-type copper oxide thin films have been prepared on soda lime silicate glass by direct current (DC) magnetron sputtering at room temperature from a pure copper metallic target in an argon atmosphere, followed by subsequent annealing steps at 300 °C under various atmospheres, namely air (CuO:air), nitrogen (CuO:N) and oxygen (CuO:O). The resultant films have been studied to understand the influence of various annealing atmospheres on the structural, spectroscopic and thermoelectric properties. X-ray diffraction (XRD) patterns of the films showed reflexes that could be assigned to those of crystalline CuO with a thin mixed Cu
(I)
Cu
(II)
oxide, which was also observed by near edge X-ray absorption fine structure spectroscopy (NEXAFS). The positive Seebeck coefficient (
S
) reached values of up to 204 μV K
−1
, confirming the p-type behavior of the films. Annealing under oxygen provided a significant improvement in the electrical conductivity up to 50 S m
−1
, resulting in a power factor of 2 μW m
−1
K
−2
. The results reveal the interplay between the intrinsic composition and the thermoelectric performance of mixed copper oxide thin films, which can be finely adjusted by simply varying the annealing atmosphere.
This study reveals the interplay between the composition and thermoelectric performance of mixed copper oxide thin films, which can be finely adjusted by varying the annealing atmosphere.</description><subject>Annealing</subject><subject>Argon</subject><subject>Atmospheres</subject><subject>Chemistry</subject><subject>Chemistry, Multidisciplinary</subject><subject>Copper</subject><subject>Copper oxides</subject><subject>Deposition</subject><subject>Diffraction patterns</subject><subject>Direct current</subject><subject>Electrical resistivity</subject><subject>Energy harvesting</subject><subject>Fine structure</subject><subject>Magnetron sputtering</subject><subject>Nitrogen</subject><subject>Oxide coatings</subject><subject>Physical Sciences</subject><subject>Power factor</subject><subject>Reflexes</subject><subject>Room temperature</subject><subject>Science & Technology</subject><subject>Seebeck effect</subject><subject>Thermoelectricity</subject><subject>Thin films</subject><subject>X ray absorption</subject><issn>2046-2069</issn><issn>2046-2069</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><sourceid>AOWDO</sourceid><sourceid>3HK</sourceid><recordid>eNqNks9rFTEQxxdRbKm9eFdXehFlNdlNYvYilPUnFASp55BkJ30p-5JtktV68W93Xl_7rB7EwDLLzCffTPKdqnpIyUtKuv7VSJLGSIS9U-23hImmJaK_e-t_rzrM-ZzgEpy2gt6v9jrOW0p6uV_9PF1BDc6BLXV09RxzaUbA4IuPodYhgJ58OKttDONVLteYzyUttixJT4iMdVlBWkeYUCV5W88pzpCKh7zRzPNSCiQYUWPGfB0v_Qi189M6P6juOT1lOLyOB9XX9-9Oh4_NyecPn4bjk8ay17I02lCGLZOx7zpn-GilsZLIXoM0QjCtDcgeOuuEw6tRkIwZbhyj0FNHpOkOqjdb3XkxaxgthIK9qzn5tU4_VNRe_VkJfqXO4jfVE877tkOBJ1sBm3wuPqgQk1aUSN4q_JhE4tn1ESleLJCLWvtsYZp0gLhk1QqBOJrCED36Cz2PSwr4AKplHacdYT1B6vnNkTHnBG7XLiVq4716S74cX3k_IPz49gV36I3TCMgt8B1MdNl6CBZ2GA4HFzgrbDMmjAy-6I3XQ1xCwa0v_n8r0o-2dMp2B_2eUqw__VddzaPrfgHkVeG-</recordid><startdate>20200812</startdate><enddate>20200812</enddate><creator>Abinaya, Chandrasekaran</creator><creator>Bethke, Kevin</creator><creator>Andrei, Virgil</creator><creator>Baumann, Jonas</creator><creator>Pollakowski-Herrmann, Beatrix</creator><creator>Kanngießer, Birgit</creator><creator>Beckhoff, Burkhard</creator><creator>Vásquez, G. Cristian</creator><creator>Mayandi, Jeyanthinath</creator><creator>Finstad, Terje G</creator><creator>Rademann, Klaus</creator><general>Royal Soc Chemistry</general><general>Royal Society of Chemistry</general><general>The Royal Society of Chemistry</general><scope>AOWDO</scope><scope>BLEPL</scope><scope>DTL</scope><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>7X8</scope><scope>3HK</scope><scope>5PM</scope><orcidid>https://orcid.org/0000-0002-0528-8635</orcidid><orcidid>https://orcid.org/0000-0002-3218-1681</orcidid><orcidid>https://orcid.org/0000-0003-1293-3126</orcidid><orcidid>https://orcid.org/0000-0002-6914-4841</orcidid><orcidid>https://orcid.org/0000-0003-3084-3917</orcidid><orcidid>https://orcid.org/0000-0002-1085-9527</orcidid></search><sort><creationdate>20200812</creationdate><title>The effect of post-deposition annealing conditions on structural and thermoelectric properties of sputtered copper oxide films</title><author>Abinaya, Chandrasekaran ; Bethke, Kevin ; Andrei, Virgil ; Baumann, Jonas ; Pollakowski-Herrmann, Beatrix ; Kanngießer, Birgit ; Beckhoff, Burkhard ; Vásquez, G. Cristian ; Mayandi, Jeyanthinath ; Finstad, Terje G ; Rademann, Klaus</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c478t-ab145520d933fb5dc8bc8089ae8b664aabe89e3cf6f3551e844b5bf41e91f08b3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><topic>Annealing</topic><topic>Argon</topic><topic>Atmospheres</topic><topic>Chemistry</topic><topic>Chemistry, Multidisciplinary</topic><topic>Copper</topic><topic>Copper oxides</topic><topic>Deposition</topic><topic>Diffraction patterns</topic><topic>Direct current</topic><topic>Electrical resistivity</topic><topic>Energy harvesting</topic><topic>Fine structure</topic><topic>Magnetron sputtering</topic><topic>Nitrogen</topic><topic>Oxide coatings</topic><topic>Physical Sciences</topic><topic>Power factor</topic><topic>Reflexes</topic><topic>Room temperature</topic><topic>Science & Technology</topic><topic>Seebeck effect</topic><topic>Thermoelectricity</topic><topic>Thin films</topic><topic>X ray absorption</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Abinaya, Chandrasekaran</creatorcontrib><creatorcontrib>Bethke, Kevin</creatorcontrib><creatorcontrib>Andrei, Virgil</creatorcontrib><creatorcontrib>Baumann, Jonas</creatorcontrib><creatorcontrib>Pollakowski-Herrmann, Beatrix</creatorcontrib><creatorcontrib>Kanngießer, Birgit</creatorcontrib><creatorcontrib>Beckhoff, Burkhard</creatorcontrib><creatorcontrib>Vásquez, G. Cristian</creatorcontrib><creatorcontrib>Mayandi, Jeyanthinath</creatorcontrib><creatorcontrib>Finstad, Terje G</creatorcontrib><creatorcontrib>Rademann, Klaus</creatorcontrib><collection>Web of Science - Science Citation Index Expanded - 2020</collection><collection>Web of Science Core Collection</collection><collection>Science Citation Index Expanded</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>MEDLINE - Academic</collection><collection>NORA - Norwegian Open Research Archives</collection><collection>PubMed Central (Full Participant titles)</collection><jtitle>RSC advances</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Abinaya, Chandrasekaran</au><au>Bethke, Kevin</au><au>Andrei, Virgil</au><au>Baumann, Jonas</au><au>Pollakowski-Herrmann, Beatrix</au><au>Kanngießer, Birgit</au><au>Beckhoff, Burkhard</au><au>Vásquez, G. Cristian</au><au>Mayandi, Jeyanthinath</au><au>Finstad, Terje G</au><au>Rademann, Klaus</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>The effect of post-deposition annealing conditions on structural and thermoelectric properties of sputtered copper oxide films</atitle><jtitle>RSC advances</jtitle><stitle>RSC ADV</stitle><addtitle>RSC Adv</addtitle><date>2020-08-12</date><risdate>2020</risdate><volume>1</volume><issue>49</issue><spage>29394</spage><epage>2941</epage><pages>29394-2941</pages><issn>2046-2069</issn><eissn>2046-2069</eissn><abstract>The development of thin-film thermoelectric applications in sensing and energy harvesting can benefit largely from suitable deposition methods for earth-abundant materials. In this study, p-type copper oxide thin films have been prepared on soda lime silicate glass by direct current (DC) magnetron sputtering at room temperature from a pure copper metallic target in an argon atmosphere, followed by subsequent annealing steps at 300 °C under various atmospheres, namely air (CuO:air), nitrogen (CuO:N) and oxygen (CuO:O). The resultant films have been studied to understand the influence of various annealing atmospheres on the structural, spectroscopic and thermoelectric properties. X-ray diffraction (XRD) patterns of the films showed reflexes that could be assigned to those of crystalline CuO with a thin mixed Cu
(I)
Cu
(II)
oxide, which was also observed by near edge X-ray absorption fine structure spectroscopy (NEXAFS). The positive Seebeck coefficient (
S
) reached values of up to 204 μV K
−1
, confirming the p-type behavior of the films. Annealing under oxygen provided a significant improvement in the electrical conductivity up to 50 S m
−1
, resulting in a power factor of 2 μW m
−1
K
−2
. The results reveal the interplay between the intrinsic composition and the thermoelectric performance of mixed copper oxide thin films, which can be finely adjusted by simply varying the annealing atmosphere.
This study reveals the interplay between the composition and thermoelectric performance of mixed copper oxide thin films, which can be finely adjusted by varying the annealing atmosphere.</abstract><cop>CAMBRIDGE</cop><pub>Royal Soc Chemistry</pub><pmid>35521098</pmid><doi>10.1039/d0ra03906c</doi><orcidid>https://orcid.org/0000-0002-0528-8635</orcidid><orcidid>https://orcid.org/0000-0002-3218-1681</orcidid><orcidid>https://orcid.org/0000-0003-1293-3126</orcidid><orcidid>https://orcid.org/0000-0002-6914-4841</orcidid><orcidid>https://orcid.org/0000-0003-3084-3917</orcidid><orcidid>https://orcid.org/0000-0002-1085-9527</orcidid><oa>free_for_read</oa></addata></record> |
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| subjects | Annealing Argon Atmospheres Chemistry Chemistry, Multidisciplinary Copper Copper oxides Deposition Diffraction patterns Direct current Electrical resistivity Energy harvesting Fine structure Magnetron sputtering Nitrogen Oxide coatings Physical Sciences Power factor Reflexes Room temperature Science & Technology Seebeck effect Thermoelectricity Thin films X ray absorption |
| title | The effect of post-deposition annealing conditions on structural and thermoelectric properties of sputtered copper oxide films |
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