Nanostructuring of an alkali halide surface by low temperature plasma exposure
Templating insulating surfaces at the nanoscale is an interesting prospect for applications that involve the adsorption of molecules or nanoparticles where electronic decoupling of the adsorbed species from the substrate is needed. In this study, we present a method to structure alkali halide surfac...
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| Veröffentlicht in: | Physical chemistry chemical physics : PCCP 2017-06, Vol.19 (24), p.16251-16256 |
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| container_title | Physical chemistry chemical physics : PCCP |
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| creator | Hinaut, Antoine Eren, Baran Steiner, Roland Freund, Sara Jöhr, Res Glatzel, Thilo Marot, Laurent Meyer, Ernst Kawai, Shigeki |
| description | Templating insulating surfaces at the nanoscale is an interesting prospect for applications that involve the adsorption of molecules or nanoparticles where electronic decoupling of the adsorbed species from the substrate is needed. In this study, we present a method to structure alkali halide surfaces at the nanoscale using a combination of low temperature plasma exposure and annealing, and characterize the surfaces by atomic force microscopy. We find that nanostructurating can be controlled by the duration of the exposure, the atomic mass of the plasma gas and the subsequent step-by-step annealing process. In contrast to previous studies with electron or high energy (few keV) ion irradiation, our approach of employing moderate particle energy (10-15 eV Ar
+
or He
+
ions) results in fine nanostructuring at length scales of nanometers and even single atom vacancies.
Using low temperature plasma to create nanostructures down to single atom vacancies on bulk insulators at room temperature. |
| doi_str_mv | 10.1039/c7cp02592k |
| format | Article |
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+
or He
+
ions) results in fine nanostructuring at length scales of nanometers and even single atom vacancies.
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+
or He
+
ions) results in fine nanostructuring at length scales of nanometers and even single atom vacancies.
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In this study, we present a method to structure alkali halide surfaces at the nanoscale using a combination of low temperature plasma exposure and annealing, and characterize the surfaces by atomic force microscopy. We find that nanostructurating can be controlled by the duration of the exposure, the atomic mass of the plasma gas and the subsequent step-by-step annealing process. In contrast to previous studies with electron or high energy (few keV) ion irradiation, our approach of employing moderate particle energy (10-15 eV Ar
+
or He
+
ions) results in fine nanostructuring at length scales of nanometers and even single atom vacancies.
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| fulltext | fulltext |
| identifier | ISSN: 1463-9076 |
| ispartof | Physical chemistry chemical physics : PCCP, 2017-06, Vol.19 (24), p.16251-16256 |
| issn | 1463-9076 1463-9084 |
| language | eng |
| recordid | cdi_rsc_primary_c7cp02592k |
| source | Royal Society Of Chemistry Journals 2008-; Alma/SFX Local Collection |
| subjects | Alkali halides Annealing Atomic properties Decoupling Electronics Exposure Nanostructure Surface chemistry |
| title | Nanostructuring of an alkali halide surface by low temperature plasma exposure |
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