Electrical charge-induced selective ion permeation in HfO2/porous nickel silicide hierarchical structuresElectronic supplementary information (ESI) available: SEM images of Au NP arrays obtained under optimally annealed conditions; heating profile for the formation of the NiSi conductive phase; calibration of electrolyte conductivity versus salt concentration; flexural strength of porous NiSi and AAO membrane by three-point flexural testing. See DOI: 10.1039/c5ra03278d

HfO 2 /porous nickel silicide (NiSi) hierarchical structures fabricated by metal-assisted chemical etching (MACE) followed by a silicidation process and deposition of HfO 2 by atomic layer deposition (ALD) have been. The as-formed porous structures are systematically investigated using etching solut...

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Hauptverfasser:	Lai, Chih-Chung, Lu, Chung-Han, Lin, Chia-Kai, Chen, Hsuan-Chu, Tseng, Fan-Gang, Chueh, Yu-Lun
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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