Development of Na0.5CoO2 Thick Film Prepared by Screen-Printing Process
The Na0.5Co0.9Cu0.1O2 thick film with the same thermoelectric performance as a Na0.5CoO2 bulk was formed on an alumina substrate by the screen-printing process. The power factor exceeded 0.3 mW/K2m, with the resistivity of 3.8 mΩcm and the thermopower of 108 μV/K. The thick film without any cracks s...
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creator | Tsuruta, Akihiro Tanaka, Miki Mikami, Masashi Kinemuchi, Yoshiaki Masuda, Yoshitake Shin, Woosuck Terasaki, Ichiro |
description | The Na0.5Co0.9Cu0.1O2 thick film with the same thermoelectric performance as a Na0.5CoO2 bulk was formed on an alumina substrate by the screen-printing process. The power factor exceeded 0.3 mW/K2m, with the resistivity of 3.8 mΩcm and the thermopower of 108 μV/K. The thick film without any cracks strongly adhered to the substrate. The high-quality thick film had been realized through the carefully designed and improved process, mixing NaCl to promote the anisotropic sintering of Na0.5Co0.9Cu0.1O2, inserting a CuO interlayer to adhere the film and substrate, and Co–Cu substituting Cu for Co to control the sintering temperature. |
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fullrecord | <record><control><sourceid>proquest_pubme</sourceid><recordid>TN_cdi_pubmedcentral_primary_oai_pubmedcentral_nih_gov_7346086</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2417382189</sourcerecordid><originalsourceid>FETCH-LOGICAL-c2945-44bf9f8fbd055090cd9b1b9645921f729079fad1a279b6f362ad57be2644d4233</originalsourceid><addsrcrecordid>eNpdkV9LwzAUxYMobsy9-AkKvojQmdwkbfMiyHRTGG7gfA5pm2ydbTOTdbBvb-eG_-7LvZdz-HEuF6FLggeUCnxbKUIJQIL5CeoSIaKQCMZOf80d1Pd-hduilCQgzlGHAk_aDbpo_KC3urTrStebwJrgReEBH9opBPNlkb0Ho6KsgpnTa-V0HqS74DVzWtfhzBX1pqgXrWYz7f0FOjOq9Lp_7D30NnqcD5_CyXT8PLyfhBkIxkPGUiNMYtIcc44FznKRklREjAsgJgaBY2FUThTEIo0MjUDlPE41RIzlDCjtobsDd92klc6zNrZTpVy7olJuJ60q5F-lLpZyYbcypizCSdQCro8AZz8a7TeyKnymy1LV2jZeAiMxTYAkorVe_bOubOPq9rwvVwLAoz3w5uDKnPXeafMdhmC5f5H8eRH9BCbXf5I</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2417822566</pqid></control><display><type>article</type><title>Development of Na0.5CoO2 Thick Film Prepared by Screen-Printing Process</title><source>PubMed Central Open Access</source><source>MDPI - Multidisciplinary Digital Publishing Institute</source><source>EZB-FREE-00999 freely available EZB journals</source><source>PubMed Central</source><source>Free Full-Text Journals in Chemistry</source><creator>Tsuruta, Akihiro ; Tanaka, Miki ; Mikami, Masashi ; Kinemuchi, Yoshiaki ; Masuda, Yoshitake ; Shin, Woosuck ; Terasaki, Ichiro</creator><creatorcontrib>Tsuruta, Akihiro ; Tanaka, Miki ; Mikami, Masashi ; Kinemuchi, Yoshiaki ; Masuda, Yoshitake ; Shin, Woosuck ; Terasaki, Ichiro</creatorcontrib><description>The Na0.5Co0.9Cu0.1O2 thick film with the same thermoelectric performance as a Na0.5CoO2 bulk was formed on an alumina substrate by the screen-printing process. The power factor exceeded 0.3 mW/K2m, with the resistivity of 3.8 mΩcm and the thermopower of 108 μV/K. The thick film without any cracks strongly adhered to the substrate. The high-quality thick film had been realized through the carefully designed and improved process, mixing NaCl to promote the anisotropic sintering of Na0.5Co0.9Cu0.1O2, inserting a CuO interlayer to adhere the film and substrate, and Co–Cu substituting Cu for Co to control the sintering temperature.</description><identifier>ISSN: 1996-1944</identifier><identifier>EISSN: 1996-1944</identifier><identifier>DOI: 10.3390/ma13122805</identifier><identifier>PMID: 32580332</identifier><language>eng</language><publisher>Basel: MDPI AG</publisher><subject>Aluminum oxide ; Cracks ; Decomposition ; Heat ; Interlayers ; Power factor ; Screen printing ; Sintering ; Substrates</subject><ispartof>Materials, 2020-06, Vol.13 (12), p.2805</ispartof><rights>2020. This work is licensed under http://creativecommons.org/licenses/by/3.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.</rights><rights>2020 by the authors. 2020</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c2945-44bf9f8fbd055090cd9b1b9645921f729079fad1a279b6f362ad57be2644d4233</citedby><cites>FETCH-LOGICAL-c2945-44bf9f8fbd055090cd9b1b9645921f729079fad1a279b6f362ad57be2644d4233</cites><orcidid>0000-0003-0674-3377 ; 0000-0002-6073-2639 ; 0000-0002-1866-824X ; 0000-0002-4710-1306</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://www.ncbi.nlm.nih.gov/pmc/articles/PMC7346086/pdf/$$EPDF$$P50$$Gpubmedcentral$$Hfree_for_read</linktopdf><linktohtml>$$Uhttps://www.ncbi.nlm.nih.gov/pmc/articles/PMC7346086/$$EHTML$$P50$$Gpubmedcentral$$Hfree_for_read</linktohtml><link.rule.ids>230,315,728,781,785,886,27929,27930,53796,53798</link.rule.ids></links><search><creatorcontrib>Tsuruta, Akihiro</creatorcontrib><creatorcontrib>Tanaka, Miki</creatorcontrib><creatorcontrib>Mikami, Masashi</creatorcontrib><creatorcontrib>Kinemuchi, Yoshiaki</creatorcontrib><creatorcontrib>Masuda, Yoshitake</creatorcontrib><creatorcontrib>Shin, Woosuck</creatorcontrib><creatorcontrib>Terasaki, Ichiro</creatorcontrib><title>Development of Na0.5CoO2 Thick Film Prepared by Screen-Printing Process</title><title>Materials</title><description>The Na0.5Co0.9Cu0.1O2 thick film with the same thermoelectric performance as a Na0.5CoO2 bulk was formed on an alumina substrate by the screen-printing process. The power factor exceeded 0.3 mW/K2m, with the resistivity of 3.8 mΩcm and the thermopower of 108 μV/K. The thick film without any cracks strongly adhered to the substrate. The high-quality thick film had been realized through the carefully designed and improved process, mixing NaCl to promote the anisotropic sintering of Na0.5Co0.9Cu0.1O2, inserting a CuO interlayer to adhere the film and substrate, and Co–Cu substituting Cu for Co to control the sintering temperature.</description><subject>Aluminum oxide</subject><subject>Cracks</subject><subject>Decomposition</subject><subject>Heat</subject><subject>Interlayers</subject><subject>Power factor</subject><subject>Screen printing</subject><subject>Sintering</subject><subject>Substrates</subject><issn>1996-1944</issn><issn>1996-1944</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><sourceid>ABUWG</sourceid><sourceid>AFKRA</sourceid><sourceid>AZQEC</sourceid><sourceid>BENPR</sourceid><sourceid>CCPQU</sourceid><sourceid>DWQXO</sourceid><recordid>eNpdkV9LwzAUxYMobsy9-AkKvojQmdwkbfMiyHRTGG7gfA5pm2ydbTOTdbBvb-eG_-7LvZdz-HEuF6FLggeUCnxbKUIJQIL5CeoSIaKQCMZOf80d1Pd-hduilCQgzlGHAk_aDbpo_KC3urTrStebwJrgReEBH9opBPNlkb0Ho6KsgpnTa-V0HqS74DVzWtfhzBX1pqgXrWYz7f0FOjOq9Lp_7D30NnqcD5_CyXT8PLyfhBkIxkPGUiNMYtIcc44FznKRklREjAsgJgaBY2FUThTEIo0MjUDlPE41RIzlDCjtobsDd92klc6zNrZTpVy7olJuJ60q5F-lLpZyYbcypizCSdQCro8AZz8a7TeyKnymy1LV2jZeAiMxTYAkorVe_bOubOPq9rwvVwLAoz3w5uDKnPXeafMdhmC5f5H8eRH9BCbXf5I</recordid><startdate>20200622</startdate><enddate>20200622</enddate><creator>Tsuruta, Akihiro</creator><creator>Tanaka, Miki</creator><creator>Mikami, Masashi</creator><creator>Kinemuchi, Yoshiaki</creator><creator>Masuda, Yoshitake</creator><creator>Shin, Woosuck</creator><creator>Terasaki, Ichiro</creator><general>MDPI AG</general><general>MDPI</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8FD</scope><scope>8FE</scope><scope>8FG</scope><scope>ABJCF</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>AZQEC</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>HCIFZ</scope><scope>JG9</scope><scope>KB.</scope><scope>PDBOC</scope><scope>PIMPY</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>7X8</scope><scope>5PM</scope><orcidid>https://orcid.org/0000-0003-0674-3377</orcidid><orcidid>https://orcid.org/0000-0002-6073-2639</orcidid><orcidid>https://orcid.org/0000-0002-1866-824X</orcidid><orcidid>https://orcid.org/0000-0002-4710-1306</orcidid></search><sort><creationdate>20200622</creationdate><title>Development of Na0.5CoO2 Thick Film Prepared by Screen-Printing Process</title><author>Tsuruta, Akihiro ; Tanaka, Miki ; Mikami, Masashi ; Kinemuchi, Yoshiaki ; Masuda, Yoshitake ; Shin, Woosuck ; Terasaki, Ichiro</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c2945-44bf9f8fbd055090cd9b1b9645921f729079fad1a279b6f362ad57be2644d4233</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><topic>Aluminum oxide</topic><topic>Cracks</topic><topic>Decomposition</topic><topic>Heat</topic><topic>Interlayers</topic><topic>Power factor</topic><topic>Screen printing</topic><topic>Sintering</topic><topic>Substrates</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Tsuruta, Akihiro</creatorcontrib><creatorcontrib>Tanaka, Miki</creatorcontrib><creatorcontrib>Mikami, Masashi</creatorcontrib><creatorcontrib>Kinemuchi, Yoshiaki</creatorcontrib><creatorcontrib>Masuda, Yoshitake</creatorcontrib><creatorcontrib>Shin, Woosuck</creatorcontrib><creatorcontrib>Terasaki, Ichiro</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central (Alumni Edition)</collection><collection>ProQuest Central UK/Ireland</collection><collection>ProQuest Central Essentials</collection><collection>ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Materials Science Collection</collection><collection>ProQuest Central Korea</collection><collection>SciTech Premium Collection</collection><collection>Materials Research Database</collection><collection>Materials Science Database</collection><collection>Materials Science Collection</collection><collection>Access via ProQuest (Open Access)</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><collection>MEDLINE - Academic</collection><collection>PubMed Central (Full Participant titles)</collection><jtitle>Materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Tsuruta, Akihiro</au><au>Tanaka, Miki</au><au>Mikami, Masashi</au><au>Kinemuchi, Yoshiaki</au><au>Masuda, Yoshitake</au><au>Shin, Woosuck</au><au>Terasaki, Ichiro</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Development of Na0.5CoO2 Thick Film Prepared by Screen-Printing Process</atitle><jtitle>Materials</jtitle><date>2020-06-22</date><risdate>2020</risdate><volume>13</volume><issue>12</issue><spage>2805</spage><pages>2805-</pages><issn>1996-1944</issn><eissn>1996-1944</eissn><abstract>The Na0.5Co0.9Cu0.1O2 thick film with the same thermoelectric performance as a Na0.5CoO2 bulk was formed on an alumina substrate by the screen-printing process. The power factor exceeded 0.3 mW/K2m, with the resistivity of 3.8 mΩcm and the thermopower of 108 μV/K. The thick film without any cracks strongly adhered to the substrate. The high-quality thick film had been realized through the carefully designed and improved process, mixing NaCl to promote the anisotropic sintering of Na0.5Co0.9Cu0.1O2, inserting a CuO interlayer to adhere the film and substrate, and Co–Cu substituting Cu for Co to control the sintering temperature.</abstract><cop>Basel</cop><pub>MDPI AG</pub><pmid>32580332</pmid><doi>10.3390/ma13122805</doi><orcidid>https://orcid.org/0000-0003-0674-3377</orcidid><orcidid>https://orcid.org/0000-0002-6073-2639</orcidid><orcidid>https://orcid.org/0000-0002-1866-824X</orcidid><orcidid>https://orcid.org/0000-0002-4710-1306</orcidid><oa>free_for_read</oa></addata></record> |
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subjects | Aluminum oxide Cracks Decomposition Heat Interlayers Power factor Screen printing Sintering Substrates |
title | Development of Na0.5CoO2 Thick Film Prepared by Screen-Printing Process |
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