The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO2 Thin Films and Their Insulator–Metal Transition Behavior

In this work, VO2 thin films were deposited on Si wafers (onto (100) surface) by DC magnetron sputtering under different cathode bias voltages. The effects of substrate biasing on the structural and optical properties were investigated. The results show that the metal–insulator transition (MIT) temp...

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Veröffentlicht in:	Materials 2019-07, Vol.12 (13), p.2160
Hauptverfasser:	Zhang, Chunzi, Gunes, Ozan, Li, Yuanshi, Cui, Xiaoyu, Mohammadtaheri, Masoud, Wen, Shi-Jie, Wong, Rick, Yang, Qiaoqin, Kasap, Safa
Format:	Artikel
Sprache:	eng
Schlagworte:	Attenuation coefficients Bias Cathode sputtering Crystal defects Engineering Sciences Grain size Magnetron sputtering Metal-insulator transition Morphology Optical properties Phase transitions Residual stress Scanning electron microscopy Spectrum analysis Substrates Temperature Thickness Thin films Transistors Transition temperature Transmittance Vanadium oxides
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