Wearable 1 V operating thin-film transistors with solution-processed metal-oxide semiconductor and dielectric films fabricated by deep ultra-violet photo annealing at low temperature
Amorphous metal-oxide semiconductors (AOSs) such as indium-gallium-zinc-oxide (IGZO) as an active channel have attracted substantial interests with regard to high-performance thin-film transistors (TFTs). Recently, intensive and extensive studies of flexible and/or wearable AOS-based TFTs fabricated...
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description | Amorphous metal-oxide semiconductors (AOSs) such as indium-gallium-zinc-oxide (IGZO) as an active channel have attracted substantial interests with regard to high-performance thin-film transistors (TFTs). Recently, intensive and extensive studies of flexible and/or wearable AOS-based TFTs fabricated by solution-process have been reported for emerging approaches based on device configuration and fabrication process. However, several challenges pertaining to practical and effective solution-process technologies remain to be resolved before low-power consuming AOS-based TFTs for wearable electronics can be realized. In this paper, we investigate the non-thermal annealing processes for sol-gel based metal-oxide semiconductor and dielectric films fabricated by deep ultraviolet (DUV) photo and microwave annealing at low temperature, compared to the conventional thermal annealing at high temperature. A comprehensive investigation including a comparative analysis of the effects of DUV photo and microwave annealing on the degree of metal-oxide-metal networks in amorphous IGZO and high-dielectric-constant (high-k) aluminum oxide (Al
2
O
3
) films and device performance of IGZO-TFTs in a comparison with conventional thermal annealing at 400 °C was conducted. We also demonstrate the feasibility of wearable IGZO-TFTs with Al
2
O
3
dielectrics on solution-processed polyimide films exhibiting a high on/off current ratio of 5 × 10
4
and field effect mobility up to 1.5 cm
2
/V-s operating at 1 V. In order to reduce the health risk and power consumption during the operation of wearable electronics, the operating voltage of IGZO-TFTs fabricated by non-thermal annealing at low temperature was set below ~1 V. The mechanical stability of wearable IGZO-TFTs fabricated by an all-solution-process except metal electrodes, against cyclic bending tests with diverse radius of curvatures in real-time was investigated. Highly stable and robust flexible IGZO-TFTs without passivation films were achieved even under continuous flexing with a curvature radius of 12 mm. |
doi_str_mv | 10.1038/s41598-019-44948-z |
format | Article |
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2
O
3
) films and device performance of IGZO-TFTs in a comparison with conventional thermal annealing at 400 °C was conducted. We also demonstrate the feasibility of wearable IGZO-TFTs with Al
2
O
3
dielectrics on solution-processed polyimide films exhibiting a high on/off current ratio of 5 × 10
4
and field effect mobility up to 1.5 cm
2
/V-s operating at 1 V. In order to reduce the health risk and power consumption during the operation of wearable electronics, the operating voltage of IGZO-TFTs fabricated by non-thermal annealing at low temperature was set below ~1 V. The mechanical stability of wearable IGZO-TFTs fabricated by an all-solution-process except metal electrodes, against cyclic bending tests with diverse radius of curvatures in real-time was investigated. Highly stable and robust flexible IGZO-TFTs without passivation films were achieved even under continuous flexing with a curvature radius of 12 mm.</description><identifier>ISSN: 2045-2322</identifier><identifier>EISSN: 2045-2322</identifier><identifier>DOI: 10.1038/s41598-019-44948-z</identifier><identifier>PMID: 31182751</identifier><language>eng</language><publisher>London: Nature Publishing Group UK</publisher><subject>140/133 ; 140/146 ; 142/126 ; 639/166/987 ; 639/301/1005/1007 ; Aluminum ; Aluminum oxide ; Annealing ; Comparative analysis ; Fabrication ; Gallium ; Health risks ; High temperature ; Humanities and Social Sciences ; Investigations ; Low temperature ; Metals ; multidisciplinary ; Power consumption ; Radioactivity ; Science ; Science (multidisciplinary) ; Temperature effects ; Thin films ; Transistors</subject><ispartof>Scientific reports, 2019-06, Vol.9 (1), p.8416-8416, Article 8416</ispartof><rights>The Author(s) 2019</rights><rights>The Author(s) 2019. This work is published under http://creativecommons.org/licenses/by/4.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c389z-64eb74bfd47f1ccacebbaef66072042ceaa7e47ba4bbca0514f35cf251757b773</citedby><cites>FETCH-LOGICAL-c389z-64eb74bfd47f1ccacebbaef66072042ceaa7e47ba4bbca0514f35cf251757b773</cites><orcidid>0000-0002-0935-795X</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://www.ncbi.nlm.nih.gov/pmc/articles/PMC6558031/pdf/$$EPDF$$P50$$Gpubmedcentral$$Hfree_for_read</linktopdf><linktohtml>$$Uhttps://www.ncbi.nlm.nih.gov/pmc/articles/PMC6558031/$$EHTML$$P50$$Gpubmedcentral$$Hfree_for_read</linktohtml><link.rule.ids>230,314,727,780,784,864,885,27924,27925,41120,42189,51576,53791,53793</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/31182751$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Yu, Byoung-Soo</creatorcontrib><creatorcontrib>Jeon, Jun-Young</creatorcontrib><creatorcontrib>Kang, Byeong-Cheol</creatorcontrib><creatorcontrib>Lee, Woobin</creatorcontrib><creatorcontrib>Kim, Yong-Hoon</creatorcontrib><creatorcontrib>Ha, Tae-Jun</creatorcontrib><title>Wearable 1 V operating thin-film transistors with solution-processed metal-oxide semiconductor and dielectric films fabricated by deep ultra-violet photo annealing at low temperature</title><title>Scientific reports</title><addtitle>Sci Rep</addtitle><addtitle>Sci Rep</addtitle><description>Amorphous metal-oxide semiconductors (AOSs) such as indium-gallium-zinc-oxide (IGZO) as an active channel have attracted substantial interests with regard to high-performance thin-film transistors (TFTs). Recently, intensive and extensive studies of flexible and/or wearable AOS-based TFTs fabricated by solution-process have been reported for emerging approaches based on device configuration and fabrication process. However, several challenges pertaining to practical and effective solution-process technologies remain to be resolved before low-power consuming AOS-based TFTs for wearable electronics can be realized. In this paper, we investigate the non-thermal annealing processes for sol-gel based metal-oxide semiconductor and dielectric films fabricated by deep ultraviolet (DUV) photo and microwave annealing at low temperature, compared to the conventional thermal annealing at high temperature. A comprehensive investigation including a comparative analysis of the effects of DUV photo and microwave annealing on the degree of metal-oxide-metal networks in amorphous IGZO and high-dielectric-constant (high-k) aluminum oxide (Al
2
O
3
) films and device performance of IGZO-TFTs in a comparison with conventional thermal annealing at 400 °C was conducted. We also demonstrate the feasibility of wearable IGZO-TFTs with Al
2
O
3
dielectrics on solution-processed polyimide films exhibiting a high on/off current ratio of 5 × 10
4
and field effect mobility up to 1.5 cm
2
/V-s operating at 1 V. In order to reduce the health risk and power consumption during the operation of wearable electronics, the operating voltage of IGZO-TFTs fabricated by non-thermal annealing at low temperature was set below ~1 V. The mechanical stability of wearable IGZO-TFTs fabricated by an all-solution-process except metal electrodes, against cyclic bending tests with diverse radius of curvatures in real-time was investigated. Highly stable and robust flexible IGZO-TFTs without passivation films were achieved even under continuous flexing with a curvature radius of 12 mm.</description><subject>140/133</subject><subject>140/146</subject><subject>142/126</subject><subject>639/166/987</subject><subject>639/301/1005/1007</subject><subject>Aluminum</subject><subject>Aluminum oxide</subject><subject>Annealing</subject><subject>Comparative analysis</subject><subject>Fabrication</subject><subject>Gallium</subject><subject>Health risks</subject><subject>High temperature</subject><subject>Humanities and Social Sciences</subject><subject>Investigations</subject><subject>Low temperature</subject><subject>Metals</subject><subject>multidisciplinary</subject><subject>Power consumption</subject><subject>Radioactivity</subject><subject>Science</subject><subject>Science (multidisciplinary)</subject><subject>Temperature effects</subject><subject>Thin films</subject><subject>Transistors</subject><issn>2045-2322</issn><issn>2045-2322</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2019</creationdate><recordtype>article</recordtype><sourceid>C6C</sourceid><sourceid>ABUWG</sourceid><sourceid>AFKRA</sourceid><sourceid>AZQEC</sourceid><sourceid>BENPR</sourceid><sourceid>CCPQU</sourceid><sourceid>DWQXO</sourceid><sourceid>GNUQQ</sourceid><recordid>eNp9UstuFDEQHCEQiUJ-gAOyxIWLYfwaz1yQUBQeUiQuPI6W7enZdeSxF9uTkD1x5Y_4Hr4EbzaEwAFf7FZXVVdb1TSPSfuctKx_kTkRQ49bMmDOB97j7b3mkLZcYMoovX_nfdAc53ze1iPowMnwsDlghPRUCnLY_PgMOmnjAZGf375_QnEDSRcXVqisXcCT8zMqSYfscokpo0tX1ihHvxQXA96kaCFnGNEMRXscv7oRUIbZ2RjGxVYK0mFEowMPtiRn0U4xo0mbWuhSmeYKjQAbtPg6B1-46KGgzTqWWKkBtN-Z0QX5eIkKzNf-lgSPmgeT9hmOb-6j5uPr0w8nb_HZ-zfvTl6dYcv6YYs7DkZyM41cTsRabcEYDVPXtbJ-ELWgtQQujebGWN0Kwicm7EQFkUIaKdlR83Kvu1nMDKOFUG16tUlu1ulKRe3U353g1moVL1QnRN8yUgWe3Qik-GWBXNTssgXvdYC4ZEUpF53s-cAq9Ok_0PO4pFDXqygm-47Rfoeie5RNMecE060Z0qpdNtQ-G6pmQ11nQ20r6cndNW4pv5NQAWwPyLUVVpD-zP6P7C_8eM2L</recordid><startdate>20190610</startdate><enddate>20190610</enddate><creator>Yu, Byoung-Soo</creator><creator>Jeon, Jun-Young</creator><creator>Kang, Byeong-Cheol</creator><creator>Lee, Woobin</creator><creator>Kim, Yong-Hoon</creator><creator>Ha, Tae-Jun</creator><general>Nature Publishing Group UK</general><general>Nature Publishing Group</general><scope>C6C</scope><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>3V.</scope><scope>7X7</scope><scope>7XB</scope><scope>88A</scope><scope>88E</scope><scope>88I</scope><scope>8FE</scope><scope>8FH</scope><scope>8FI</scope><scope>8FJ</scope><scope>8FK</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>AZQEC</scope><scope>BBNVY</scope><scope>BENPR</scope><scope>BHPHI</scope><scope>CCPQU</scope><scope>DWQXO</scope><scope>FYUFA</scope><scope>GHDGH</scope><scope>GNUQQ</scope><scope>HCIFZ</scope><scope>K9.</scope><scope>LK8</scope><scope>M0S</scope><scope>M1P</scope><scope>M2P</scope><scope>M7P</scope><scope>PIMPY</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>Q9U</scope><scope>7X8</scope><scope>5PM</scope><orcidid>https://orcid.org/0000-0002-0935-795X</orcidid></search><sort><creationdate>20190610</creationdate><title>Wearable 1 V operating thin-film transistors with solution-processed metal-oxide semiconductor and dielectric films fabricated by deep ultra-violet photo annealing at low temperature</title><author>Yu, Byoung-Soo ; Jeon, Jun-Young ; Kang, Byeong-Cheol ; Lee, Woobin ; Kim, Yong-Hoon ; Ha, Tae-Jun</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c389z-64eb74bfd47f1ccacebbaef66072042ceaa7e47ba4bbca0514f35cf251757b773</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2019</creationdate><topic>140/133</topic><topic>140/146</topic><topic>142/126</topic><topic>639/166/987</topic><topic>639/301/1005/1007</topic><topic>Aluminum</topic><topic>Aluminum oxide</topic><topic>Annealing</topic><topic>Comparative analysis</topic><topic>Fabrication</topic><topic>Gallium</topic><topic>Health risks</topic><topic>High temperature</topic><topic>Humanities and Social Sciences</topic><topic>Investigations</topic><topic>Low temperature</topic><topic>Metals</topic><topic>multidisciplinary</topic><topic>Power consumption</topic><topic>Radioactivity</topic><topic>Science</topic><topic>Science (multidisciplinary)</topic><topic>Temperature effects</topic><topic>Thin films</topic><topic>Transistors</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Yu, Byoung-Soo</creatorcontrib><creatorcontrib>Jeon, Jun-Young</creatorcontrib><creatorcontrib>Kang, Byeong-Cheol</creatorcontrib><creatorcontrib>Lee, Woobin</creatorcontrib><creatorcontrib>Kim, Yong-Hoon</creatorcontrib><creatorcontrib>Ha, Tae-Jun</creatorcontrib><collection>Springer Nature OA Free Journals</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>ProQuest Central (Corporate)</collection><collection>Health & Medical Collection</collection><collection>ProQuest Central (purchase pre-March 2016)</collection><collection>Biology Database (Alumni Edition)</collection><collection>Medical Database (Alumni Edition)</collection><collection>Science Database (Alumni Edition)</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Natural Science Collection</collection><collection>Hospital Premium Collection</collection><collection>Hospital Premium Collection (Alumni Edition)</collection><collection>ProQuest Central (Alumni) (purchase pre-March 2016)</collection><collection>ProQuest Central (Alumni Edition)</collection><collection>ProQuest Central UK/Ireland</collection><collection>ProQuest Central Essentials</collection><collection>Biological Science Collection</collection><collection>ProQuest Central</collection><collection>Natural Science Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Central Korea</collection><collection>Health Research Premium Collection</collection><collection>Health Research Premium Collection (Alumni)</collection><collection>ProQuest Central Student</collection><collection>SciTech Premium Collection</collection><collection>ProQuest Health & Medical Complete (Alumni)</collection><collection>ProQuest Biological Science Collection</collection><collection>Health & Medical Collection (Alumni Edition)</collection><collection>Medical Database</collection><collection>Science Database</collection><collection>Biological Science Database</collection><collection>Publicly Available Content Database</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central Basic</collection><collection>MEDLINE - Academic</collection><collection>PubMed Central (Full Participant titles)</collection><jtitle>Scientific reports</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Yu, Byoung-Soo</au><au>Jeon, Jun-Young</au><au>Kang, Byeong-Cheol</au><au>Lee, Woobin</au><au>Kim, Yong-Hoon</au><au>Ha, Tae-Jun</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Wearable 1 V operating thin-film transistors with solution-processed metal-oxide semiconductor and dielectric films fabricated by deep ultra-violet photo annealing at low temperature</atitle><jtitle>Scientific reports</jtitle><stitle>Sci Rep</stitle><addtitle>Sci Rep</addtitle><date>2019-06-10</date><risdate>2019</risdate><volume>9</volume><issue>1</issue><spage>8416</spage><epage>8416</epage><pages>8416-8416</pages><artnum>8416</artnum><issn>2045-2322</issn><eissn>2045-2322</eissn><abstract>Amorphous metal-oxide semiconductors (AOSs) such as indium-gallium-zinc-oxide (IGZO) as an active channel have attracted substantial interests with regard to high-performance thin-film transistors (TFTs). Recently, intensive and extensive studies of flexible and/or wearable AOS-based TFTs fabricated by solution-process have been reported for emerging approaches based on device configuration and fabrication process. However, several challenges pertaining to practical and effective solution-process technologies remain to be resolved before low-power consuming AOS-based TFTs for wearable electronics can be realized. In this paper, we investigate the non-thermal annealing processes for sol-gel based metal-oxide semiconductor and dielectric films fabricated by deep ultraviolet (DUV) photo and microwave annealing at low temperature, compared to the conventional thermal annealing at high temperature. A comprehensive investigation including a comparative analysis of the effects of DUV photo and microwave annealing on the degree of metal-oxide-metal networks in amorphous IGZO and high-dielectric-constant (high-k) aluminum oxide (Al
2
O
3
) films and device performance of IGZO-TFTs in a comparison with conventional thermal annealing at 400 °C was conducted. We also demonstrate the feasibility of wearable IGZO-TFTs with Al
2
O
3
dielectrics on solution-processed polyimide films exhibiting a high on/off current ratio of 5 × 10
4
and field effect mobility up to 1.5 cm
2
/V-s operating at 1 V. In order to reduce the health risk and power consumption during the operation of wearable electronics, the operating voltage of IGZO-TFTs fabricated by non-thermal annealing at low temperature was set below ~1 V. The mechanical stability of wearable IGZO-TFTs fabricated by an all-solution-process except metal electrodes, against cyclic bending tests with diverse radius of curvatures in real-time was investigated. Highly stable and robust flexible IGZO-TFTs without passivation films were achieved even under continuous flexing with a curvature radius of 12 mm.</abstract><cop>London</cop><pub>Nature Publishing Group UK</pub><pmid>31182751</pmid><doi>10.1038/s41598-019-44948-z</doi><tpages>1</tpages><orcidid>https://orcid.org/0000-0002-0935-795X</orcidid><oa>free_for_read</oa></addata></record> |
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subjects | 140/133 140/146 142/126 639/166/987 639/301/1005/1007 Aluminum Aluminum oxide Annealing Comparative analysis Fabrication Gallium Health risks High temperature Humanities and Social Sciences Investigations Low temperature Metals multidisciplinary Power consumption Radioactivity Science Science (multidisciplinary) Temperature effects Thin films Transistors |
title | Wearable 1 V operating thin-film transistors with solution-processed metal-oxide semiconductor and dielectric films fabricated by deep ultra-violet photo annealing at low temperature |
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