An Inductively Coupled Plasma Source for the Gaseous Electronics Conference RF Reference Cell
In order to extend the operating range of the GEC RF Reference Cell, we developed an inductively coupled plasma source that replaced the standard parallel-plate upper-electrode assembly. Voltage and current probes, Langmuir probes, and an 80 GHz interferometer provided information on plasmas formed...
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| Veröffentlicht in: | Journal of Research of the National Institute of Standards and Technology 1995-07, Vol.100 (4), p.427-439 |
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| container_issue | 4 |
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| container_title | Journal of Research of the National Institute of Standards and Technology |
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| creator | Miller, Paul A Hebner, Gregory A Greenberg, Kenneth E Pochan, Paul D Aragon, Ben P |
| description | In order to extend the operating range of the GEC RF Reference Cell, we developed an inductively coupled plasma source that replaced the standard parallel-plate upper-electrode assembly. Voltage and current probes, Langmuir probes, and an 80 GHz interferometer provided information on plasmas formed in argon, chlorine, and nitrogen at pressures from 0.1 Pa to 3 Pa. For powers deposited in the plasma from 20 W to 300 W, the source produced peak electron densities between 10
/cm
and 10
/cm
and electron temperatures near 4 eV. The electron density peaked on axis with typical full-width at half maximum of 7 cm to 9 cm. Discharges in chlorine and nitrogen had bimodal operation that was clearly evident from optical emission intensity. A dim mode occurred at low power and a bright mode at high power. The transition between modes had hysteresis. After many hours of high-power operation, films formed on electrodes and walls of one Cell. These deposits affected the dim-to-bright mode transition, and also apparently caused generation of hot electrons and increased the plasma potential. |
| doi_str_mv | 10.6028/jres.100.032 |
| format | Article |
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/cm
and 10
/cm
and electron temperatures near 4 eV. The electron density peaked on axis with typical full-width at half maximum of 7 cm to 9 cm. Discharges in chlorine and nitrogen had bimodal operation that was clearly evident from optical emission intensity. A dim mode occurred at low power and a bright mode at high power. The transition between modes had hysteresis. After many hours of high-power operation, films formed on electrodes and walls of one Cell. These deposits affected the dim-to-bright mode transition, and also apparently caused generation of hot electrons and increased the plasma potential.</description><identifier>ISSN: 1044-677X</identifier><identifier>EISSN: 2165-7254</identifier><identifier>DOI: 10.6028/jres.100.032</identifier><identifier>PMID: 29151752</identifier><language>eng</language><publisher>United States: [Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology</publisher><subject>CALIBRATION STANDARDS ; CHEMICAL REACTORS ; ENGINEERING NOT INCLUDED IN OTHER CATEGORIES ; FABRICATION ; GLOW DISCHARGES ; MICROELECTRONIC CIRCUITS ; PLASMA DIAGNOSTICS ; PLASMA PRODUCTION</subject><ispartof>Journal of Research of the National Institute of Standards and Technology, 1995-07, Vol.100 (4), p.427-439</ispartof><rights>1995</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c406t-28bddd96eb0b08b319a835a0edf0f484adb12cdcd6574572f1f4215eed4537bc3</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://www.ncbi.nlm.nih.gov/pmc/articles/PMC4887237/pdf/$$EPDF$$P50$$Gpubmedcentral$$Hfree_for_read</linktopdf><linktohtml>$$Uhttps://www.ncbi.nlm.nih.gov/pmc/articles/PMC4887237/$$EHTML$$P50$$Gpubmedcentral$$Hfree_for_read</linktohtml><link.rule.ids>230,314,725,778,782,883,27907,27908,53774,53776</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/29151752$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink><backlink>$$Uhttps://www.osti.gov/biblio/163202$$D View this record in Osti.gov$$Hfree_for_read</backlink></links><search><creatorcontrib>Miller, Paul A</creatorcontrib><creatorcontrib>Hebner, Gregory A</creatorcontrib><creatorcontrib>Greenberg, Kenneth E</creatorcontrib><creatorcontrib>Pochan, Paul D</creatorcontrib><creatorcontrib>Aragon, Ben P</creatorcontrib><creatorcontrib>Sandia National Laboratory</creatorcontrib><title>An Inductively Coupled Plasma Source for the Gaseous Electronics Conference RF Reference Cell</title><title>Journal of Research of the National Institute of Standards and Technology</title><addtitle>J Res Natl Inst Stand Technol</addtitle><description>In order to extend the operating range of the GEC RF Reference Cell, we developed an inductively coupled plasma source that replaced the standard parallel-plate upper-electrode assembly. Voltage and current probes, Langmuir probes, and an 80 GHz interferometer provided information on plasmas formed in argon, chlorine, and nitrogen at pressures from 0.1 Pa to 3 Pa. For powers deposited in the plasma from 20 W to 300 W, the source produced peak electron densities between 10
/cm
and 10
/cm
and electron temperatures near 4 eV. The electron density peaked on axis with typical full-width at half maximum of 7 cm to 9 cm. Discharges in chlorine and nitrogen had bimodal operation that was clearly evident from optical emission intensity. A dim mode occurred at low power and a bright mode at high power. The transition between modes had hysteresis. After many hours of high-power operation, films formed on electrodes and walls of one Cell. These deposits affected the dim-to-bright mode transition, and also apparently caused generation of hot electrons and increased the plasma potential.</description><subject>CALIBRATION STANDARDS</subject><subject>CHEMICAL REACTORS</subject><subject>ENGINEERING NOT INCLUDED IN OTHER CATEGORIES</subject><subject>FABRICATION</subject><subject>GLOW DISCHARGES</subject><subject>MICROELECTRONIC CIRCUITS</subject><subject>PLASMA DIAGNOSTICS</subject><subject>PLASMA PRODUCTION</subject><issn>1044-677X</issn><issn>2165-7254</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1995</creationdate><recordtype>article</recordtype><recordid>eNpVkc1LJDEQxYOs6OjuzfOSve3Bns13ui8LMvgFguKu4GUJ6aTaaelJxqRb8L_fDKOiuYSifnn1Kg-hI0rmirD612OCPKeEzAlnO2jGqJKVZlJ8QTNKhKiU1vf76CDnR1KOEs0e2mcNlVRLNkP_TgK-DH5yY_8MwwtexGk9gMc3g80ri__EKTnAXUx4XAI-txnilPHpAG5MMfQulxehgwShYLdn-BbeigUMw1e029khw7fX-xDdnZ3-XVxUV9fnl4uTq8oJosaK1a33vlHQkpbULaeNrbm0BHxHOlEL61vKnHdeSS2kZh3tBKMSwAvJdev4Ifq91V1P7Qq8gzAmO5h16lc2vZhoe_O5E_qleYjPRtS1ZlwXgR9bgZjH3mTXj-CWLoZQ9jRUcUZYYX6-DknxaYI8mlWfXdnShs2nGNooJQRvWF3Q4y3qUsw5QfduhRKzSc1sUisFMSW1gn__aP8dfouJ_weeVpTO</recordid><startdate>19950701</startdate><enddate>19950701</enddate><creator>Miller, Paul A</creator><creator>Hebner, Gregory A</creator><creator>Greenberg, Kenneth E</creator><creator>Pochan, Paul D</creator><creator>Aragon, Ben P</creator><general>[Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology</general><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope><scope>OTOTI</scope><scope>5PM</scope></search><sort><creationdate>19950701</creationdate><title>An Inductively Coupled Plasma Source for the Gaseous Electronics Conference RF Reference Cell</title><author>Miller, Paul A ; Hebner, Gregory A ; Greenberg, Kenneth E ; Pochan, Paul D ; Aragon, Ben P</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c406t-28bddd96eb0b08b319a835a0edf0f484adb12cdcd6574572f1f4215eed4537bc3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1995</creationdate><topic>CALIBRATION STANDARDS</topic><topic>CHEMICAL REACTORS</topic><topic>ENGINEERING NOT INCLUDED IN OTHER CATEGORIES</topic><topic>FABRICATION</topic><topic>GLOW DISCHARGES</topic><topic>MICROELECTRONIC CIRCUITS</topic><topic>PLASMA DIAGNOSTICS</topic><topic>PLASMA PRODUCTION</topic><toplevel>online_resources</toplevel><creatorcontrib>Miller, Paul A</creatorcontrib><creatorcontrib>Hebner, Gregory A</creatorcontrib><creatorcontrib>Greenberg, Kenneth E</creatorcontrib><creatorcontrib>Pochan, Paul D</creatorcontrib><creatorcontrib>Aragon, Ben P</creatorcontrib><creatorcontrib>Sandia National Laboratory</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><collection>OSTI.GOV</collection><collection>PubMed Central (Full Participant titles)</collection><jtitle>Journal of Research of the National Institute of Standards and Technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Miller, Paul A</au><au>Hebner, Gregory A</au><au>Greenberg, Kenneth E</au><au>Pochan, Paul D</au><au>Aragon, Ben P</au><aucorp>Sandia National Laboratory</aucorp><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>An Inductively Coupled Plasma Source for the Gaseous Electronics Conference RF Reference Cell</atitle><jtitle>Journal of Research of the National Institute of Standards and Technology</jtitle><addtitle>J Res Natl Inst Stand Technol</addtitle><date>1995-07-01</date><risdate>1995</risdate><volume>100</volume><issue>4</issue><spage>427</spage><epage>439</epage><pages>427-439</pages><issn>1044-677X</issn><eissn>2165-7254</eissn><abstract>In order to extend the operating range of the GEC RF Reference Cell, we developed an inductively coupled plasma source that replaced the standard parallel-plate upper-electrode assembly. Voltage and current probes, Langmuir probes, and an 80 GHz interferometer provided information on plasmas formed in argon, chlorine, and nitrogen at pressures from 0.1 Pa to 3 Pa. For powers deposited in the plasma from 20 W to 300 W, the source produced peak electron densities between 10
/cm
and 10
/cm
and electron temperatures near 4 eV. The electron density peaked on axis with typical full-width at half maximum of 7 cm to 9 cm. Discharges in chlorine and nitrogen had bimodal operation that was clearly evident from optical emission intensity. A dim mode occurred at low power and a bright mode at high power. The transition between modes had hysteresis. After many hours of high-power operation, films formed on electrodes and walls of one Cell. These deposits affected the dim-to-bright mode transition, and also apparently caused generation of hot electrons and increased the plasma potential.</abstract><cop>United States</cop><pub>[Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology</pub><pmid>29151752</pmid><doi>10.6028/jres.100.032</doi><tpages>13</tpages><oa>free_for_read</oa></addata></record> |
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| identifier | ISSN: 1044-677X |
| ispartof | Journal of Research of the National Institute of Standards and Technology, 1995-07, Vol.100 (4), p.427-439 |
| issn | 1044-677X 2165-7254 |
| language | eng |
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| source | PubMed Central; Alma/SFX Local Collection; Free Full-Text Journals in Chemistry |
| subjects | CALIBRATION STANDARDS CHEMICAL REACTORS ENGINEERING NOT INCLUDED IN OTHER CATEGORIES FABRICATION GLOW DISCHARGES MICROELECTRONIC CIRCUITS PLASMA DIAGNOSTICS PLASMA PRODUCTION |
| title | An Inductively Coupled Plasma Source for the Gaseous Electronics Conference RF Reference Cell |
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