Thermally stable dielectric responses in uniaxially (001)-oriented CaBi4Ti4O15 nanofilms grown on a Ca2Nb3O10− nanosheet seed layer

To realize a high-temperature capacitor, uniaxially (001)-oriented CaBi 4 Ti 4 O 15 films with various film thicknesses were prepared on (100) c SrRuO 3 /Ca 2 Nb 3 O 10 − nanosheet/glass substrates. As the film thickness decreases to 50 nm, the out-of-plane lattice parameters decrease while the in-plane lattice ones increase due to the in-plane tensile strain. However, the relative dielectric constant (ε r ) at room temperature exhibits a negligible degradation as the film thickness decreases to 50 nm, suggesting that ε r of (001)-oriented CaBi 4 Ti 4 O 15 is less sensitive to the residual strain. The capacitance density increases monotonously with decreasing film thickness, reaching a value of 4.5 μF/cm 2 for a 50-nm-thick nanofilm and is stable against temperature changes from room temperature to 400 °C irrespective of film thickness. This behaviour differs from that of the widely investigated perovskite-structured dielectrics. These results show that (001)-oriented CaBi 4 Ti 4 O 15 films derived using Ca 2 Nb 3 O 10 − nanosheets as seed layers can be made candidates for high-temperature capacitor applications by a small change in the dielectric properties against film thickness and temperature variations.