Damage evaluation in graphene underlying atomic layer deposition dielectrics

Based on micro-Raman spectroscopy (μRS) and X-ray photoelectron spectroscopy (XPS), we study the structural damage incurred in monolayer (1L) and few-layer (FL) graphene subjected to atomic-layer deposition of HfO 2 and Al 2 O 3 upon different oxygen plasma power levels. We evaluate the damage level...

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Veröffentlicht in:	Scientific reports 2015-08, Vol.5 (1), p.13523, Article 13523
Hauptverfasser:	Tang, Xiaohui, Reckinger, Nicolas, Poncelet, Olivier, Louette, Pierre, Ureña, Ferran, Idrissi, Hosni, Turner, Stuart, Cabosart, Damien, Colomer, Jean-François, Raskin, Jean-Pierre, Hackens, Benoit, Francis, Laurent A.
Format:	Artikel
Sprache:	eng
Schlagworte:	639/301/357/537 639/301/357/918 Humanities and Social Sciences multidisciplinary Photoelectron spectroscopy Raman spectroscopy Science Solar cells Spectroscopy Spectrum analysis Transistors
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