An Antireflective Nanostructure Array Fabricated by Nanosilver Colloidal Lithography on a Silicon Substrate
An alternative method is presented for fabricating an antireflective nanostructure array using nanosilver colloidal lithography. Spin coating was used to produce the multilayered silver nanoparticles, which grew by self-assembly and were transformed into randomly distributed nanosilver islands throu...
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| Veröffentlicht in: | Nanoscale research letters 2010-07, Vol.5 (10), p.1570-1577 |
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| container_title | Nanoscale research letters |
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| creator | Park, Seong-Je Lee, Soon-Won Lee, Ki-Joong Lee, Ji-Hye Kim, Ki-Don Jeong, Jun-Ho Choi, Jun-Hyuk |
| description | An alternative method is presented for fabricating an antireflective nanostructure array using nanosilver colloidal lithography. Spin coating was used to produce the multilayered silver nanoparticles, which grew by self-assembly and were transformed into randomly distributed nanosilver islands through the thermodynamic action of dewetting and Oswald ripening. The average size and coverage rate of the islands increased with concentration in the range of 50–90 nm and 40–65%, respectively. The nanosilver islands were critically affected by concentration and spin speed. The effects of these two parameters were investigated, after etching and wet removal of nanosilver residues. The reflection nearly disappeared in the ultraviolet wavelength range and was 17% of the reflection of a bare silicon wafer in the visible range. |
| doi_str_mv | 10.1007/s11671-010-9678-y |
| format | Article |
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Spin coating was used to produce the multilayered silver nanoparticles, which grew by self-assembly and were transformed into randomly distributed nanosilver islands through the thermodynamic action of dewetting and Oswald ripening. The average size and coverage rate of the islands increased with concentration in the range of 50–90 nm and 40–65%, respectively. The nanosilver islands were critically affected by concentration and spin speed. The effects of these two parameters were investigated, after etching and wet removal of nanosilver residues. The reflection nearly disappeared in the ultraviolet wavelength range and was 17% of the reflection of a bare silicon wafer in the visible range.</description><identifier>ISSN: 1931-7573</identifier><identifier>EISSN: 1556-276X</identifier><identifier>DOI: 10.1007/s11671-010-9678-y</identifier><identifier>PMID: 21076677</identifier><language>eng</language><publisher>New York: Springer New York</publisher><subject>Chemistry and Materials Science ; Materials Science ; Molecular Medicine ; Nano Express ; Nanochemistry ; Nanoscale Science and Technology ; Nanotechnology ; Nanotechnology and Microengineering</subject><ispartof>Nanoscale research letters, 2010-07, Vol.5 (10), p.1570-1577</ispartof><rights>The Author(s) 2010</rights><rights>The Authors 2010</rights><rights>Copyright © 2010 The Author(s) 2010 The Author(s)</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c513t-abd9f15057b3a417c8aedd17003daae2afbb7b3e3747e1a0ba922f36c869ad803</citedby><cites>FETCH-LOGICAL-c513t-abd9f15057b3a417c8aedd17003daae2afbb7b3e3747e1a0ba922f36c869ad803</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://www.ncbi.nlm.nih.gov/pmc/articles/PMC2956053/pdf/$$EPDF$$P50$$Gpubmedcentral$$Hfree_for_read</linktopdf><linktohtml>$$Uhttps://www.ncbi.nlm.nih.gov/pmc/articles/PMC2956053/$$EHTML$$P50$$Gpubmedcentral$$Hfree_for_read</linktohtml><link.rule.ids>230,314,727,780,784,864,885,27924,27925,53791,53793</link.rule.ids></links><search><creatorcontrib>Park, Seong-Je</creatorcontrib><creatorcontrib>Lee, Soon-Won</creatorcontrib><creatorcontrib>Lee, Ki-Joong</creatorcontrib><creatorcontrib>Lee, Ji-Hye</creatorcontrib><creatorcontrib>Kim, Ki-Don</creatorcontrib><creatorcontrib>Jeong, Jun-Ho</creatorcontrib><creatorcontrib>Choi, Jun-Hyuk</creatorcontrib><title>An Antireflective Nanostructure Array Fabricated by Nanosilver Colloidal Lithography on a Silicon Substrate</title><title>Nanoscale research letters</title><addtitle>Nanoscale Res Lett</addtitle><description>An alternative method is presented for fabricating an antireflective nanostructure array using nanosilver colloidal lithography. Spin coating was used to produce the multilayered silver nanoparticles, which grew by self-assembly and were transformed into randomly distributed nanosilver islands through the thermodynamic action of dewetting and Oswald ripening. The average size and coverage rate of the islands increased with concentration in the range of 50–90 nm and 40–65%, respectively. The nanosilver islands were critically affected by concentration and spin speed. The effects of these two parameters were investigated, after etching and wet removal of nanosilver residues. The reflection nearly disappeared in the ultraviolet wavelength range and was 17% of the reflection of a bare silicon wafer in the visible range.</description><subject>Chemistry and Materials Science</subject><subject>Materials Science</subject><subject>Molecular Medicine</subject><subject>Nano Express</subject><subject>Nanochemistry</subject><subject>Nanoscale Science and Technology</subject><subject>Nanotechnology</subject><subject>Nanotechnology and Microengineering</subject><issn>1931-7573</issn><issn>1556-276X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2010</creationdate><recordtype>article</recordtype><sourceid>C6C</sourceid><sourceid>ABUWG</sourceid><sourceid>AFKRA</sourceid><sourceid>AZQEC</sourceid><sourceid>BENPR</sourceid><sourceid>CCPQU</sourceid><sourceid>DWQXO</sourceid><sourceid>GNUQQ</sourceid><recordid>eNp1kUGLFDEQhYO4uOvqD_AW8OKlNdWZJN0XYRhcFQY97C7sLVTS6Zmsmc6YdA_0vzdDL6KCpyqo772q5BHyBth7YEx9yABSQcWAVa1UTTU_I1cghKxqJR-el77lUCmh-CV5mfMjYyvFlHxBLmsoVSp1RX6sB7oeRp9cH5wd_cnRbzjEPKbJjlNydJ0SzvQGTfIWR9dRMy-EDyeX6CaGEH2HgW79uI-7hMf9TONAkd764G3pbidT7Ir2FbnoMWT3-qlek_ubT3ebL9X2--evm_W2sgL4WKHp2h4EE8pwXIGyDbquA8UY7xBdjb0xZeS4WikHyAy2dd1zaRvZYtcwfk0-Lr7HyRxcZ91Q1gd9TP6AadYRvf57Mvi93sWTrlshmeDF4N2TQYo_J5dHffDZuhBwcHHKGhpgQijZnne9_Qd9jFMayvM0KKi54is4U7BQNsWcy1__PgaYPkeplyh1iVKfo9Rz0dSLJhd22Ln0h_N_Rb8A_36jNg</recordid><startdate>20100714</startdate><enddate>20100714</enddate><creator>Park, Seong-Je</creator><creator>Lee, Soon-Won</creator><creator>Lee, Ki-Joong</creator><creator>Lee, Ji-Hye</creator><creator>Kim, Ki-Don</creator><creator>Jeong, Jun-Ho</creator><creator>Choi, Jun-Hyuk</creator><general>Springer New York</general><general>Springer Nature B.V</general><general>Springer</general><scope>C6C</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7QF</scope><scope>7QO</scope><scope>7QQ</scope><scope>7SC</scope><scope>7SE</scope><scope>7SP</scope><scope>7SR</scope><scope>7TA</scope><scope>7TB</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>8FE</scope><scope>8FG</scope><scope>8FH</scope><scope>ABJCF</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>AZQEC</scope><scope>BBNVY</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>BHPHI</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>F28</scope><scope>FR3</scope><scope>GNUQQ</scope><scope>H8D</scope><scope>H8G</scope><scope>HCIFZ</scope><scope>JG9</scope><scope>JQ2</scope><scope>KB.</scope><scope>KR7</scope><scope>L7M</scope><scope>LK8</scope><scope>L~C</scope><scope>L~D</scope><scope>M7P</scope><scope>P64</scope><scope>PDBOC</scope><scope>PIMPY</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>7X8</scope><scope>5PM</scope></search><sort><creationdate>20100714</creationdate><title>An Antireflective Nanostructure Array Fabricated by Nanosilver Colloidal Lithography on a Silicon Substrate</title><author>Park, Seong-Je ; 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| subjects | Chemistry and Materials Science Materials Science Molecular Medicine Nano Express Nanochemistry Nanoscale Science and Technology Nanotechnology Nanotechnology and Microengineering |
| title | An Antireflective Nanostructure Array Fabricated by Nanosilver Colloidal Lithography on a Silicon Substrate |
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