All‐Epitaxial Self‐Assembly of Silicon Color Centers Confined Within Sub‐Nanometer Thin Layers Using Ultra‐Low Temperature Epitaxy

Silicon‐based color‐centers (SiCCs) have recently emerged as quantum‐light sources that can be combined with telecom‐range Si Photonics platforms. Unfortunately, using conventional SiCC fabrication schemes, deterministic control over the vertical emitter position is impossible due to the stochastic...

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Veröffentlicht in:Advanced materials (Weinheim) 2024-11, Vol.36 (48), p.e2408424-n/a
Hauptverfasser: Aberl, Johannes, Navarrete, Enrique Prado, Karaman, Merve, Enriquez, Diego Haya, Wilflingseder, Christoph, Salomon, Andreas, Primetzhofer, Daniel, Schubert, Markus Andreas, Capellini, Giovanni, Fromherz, Thomas, Deák, Peter, Udvarhelyi, Péter, Li, Song, Gali, Ádám, Brehm, Moritz
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Sprache:eng
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