Effect of Discharge Gas Composition on SiC Etching in an HFE-347mmy/O2/Ar Plasma
This study explores the impact of varying discharge gas compositions on the etching performance of silicon carbide (SiC) in a heptafluoroisopropyl methyl ether (HFE-347mmy)/O2/Ar plasma. SiC is increasingly favored for high-temperature and high-power applications due to its wide bandgap and high die...
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| Veröffentlicht in: | Materials 2024-08, Vol.17 (16), p.3917 |
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| creator | You, Sanghyun Sun, Eunjae Chae, Heeyeop Kim, Chang-Koo |
| description | This study explores the impact of varying discharge gas compositions on the etching performance of silicon carbide (SiC) in a heptafluoroisopropyl methyl ether (HFE-347mmy)/O2/Ar plasma. SiC is increasingly favored for high-temperature and high-power applications due to its wide bandgap and high dielectric strength, but its chemical stability makes it challenging to etch. This research explores the use of HFE-347mmy as a low-global-warming-potential (GWP) alternative to the conventional high-GWP fluorinated gasses that are typically used in plasma etching. By examining the behavior of SiC etch rates and analyzing the formation of fluorocarbon films and Si-O bonds, this study provides insights into optimizing plasma conditions for effective SiC etching, while addressing environmental concerns associated with high-GWP gasses. |
| doi_str_mv | 10.3390/ma17163917 |
| format | Article |
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SiC is increasingly favored for high-temperature and high-power applications due to its wide bandgap and high dielectric strength, but its chemical stability makes it challenging to etch. This research explores the use of HFE-347mmy as a low-global-warming-potential (GWP) alternative to the conventional high-GWP fluorinated gasses that are typically used in plasma etching. 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| source | PubMed Central Open Access; MDPI - Multidisciplinary Digital Publishing Institute; EZB-FREE-00999 freely available EZB journals; PubMed Central; Free Full-Text Journals in Chemistry |
| subjects | Argon plasma Composition effects Dielectric strength Discharge Electrodes Emission standards Emissions Gas composition High temperature Perfluoroalkyl & polyfluoroalkyl substances Perfluorocarbons Plasma etching Silicon carbide Temperature |
| title | Effect of Discharge Gas Composition on SiC Etching in an HFE-347mmy/O2/Ar Plasma |
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