Effects of Plasma Treatment on the Surface and Photocatalytic Properties of Nanostructured SnO2–SiO2 Films
In this work, we study the effects of treating nanostructured SnO2–SiO2 films derived by a sol-gel method with nitrogen and oxygen plasma. The structural and chemical properties of the films are closely investigated. To quantify surface site activity in the films following treatment, we employed a p...
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| Veröffentlicht in: | Materials 2023-07, Vol.16 (14), p.5030 |
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| creator | Pronin, Igor A. Sigaev, Alexander P. Komolov, Alexei S. Zhizhin, Evgeny V. Karmanov, Andrey A. Yakushova, Nadezhda D. Kyashkin, Vladimir M. Nishchev, Konstantin N. Sysoev, Victor V. Goel, Sanket Amreen, Khairunnisa K, Ramya Korotcenkov, Ghenadii |
| description | In this work, we study the effects of treating nanostructured SnO2–SiO2 films derived by a sol-gel method with nitrogen and oxygen plasma. The structural and chemical properties of the films are closely investigated. To quantify surface site activity in the films following treatment, we employed a photocatalytic UV degradation test with brilliant green. Using X-ray photoelectron spectroscopy, it was found that treatment with oxygen plasma led to a high deviation in the stoichiometry of the SnO2 surface and even the appearance of a tin monoxide phase. These samples also exhibited a maximum photocatalytic activity. In contrast, treatment with nitrogen plasma did not lead to any noticeable changes in the material. However, increasing the power of the plasma source from 250 W to 500 W led to the appearance of an SnO fraction on the surface and a reduction in the photocatalytic activity. In general, all the types of plasma treatment tested led to amorphization in the SnO2–SiO2 samples. |
| doi_str_mv | 10.3390/ma16145030 |
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The structural and chemical properties of the films are closely investigated. To quantify surface site activity in the films following treatment, we employed a photocatalytic UV degradation test with brilliant green. Using X-ray photoelectron spectroscopy, it was found that treatment with oxygen plasma led to a high deviation in the stoichiometry of the SnO2 surface and even the appearance of a tin monoxide phase. These samples also exhibited a maximum photocatalytic activity. In contrast, treatment with nitrogen plasma did not lead to any noticeable changes in the material. However, increasing the power of the plasma source from 250 W to 500 W led to the appearance of an SnO fraction on the surface and a reduction in the photocatalytic activity. In general, all the types of plasma treatment tested led to amorphization in the SnO2–SiO2 samples.</description><identifier>ISSN: 1996-1944</identifier><identifier>EISSN: 1996-1944</identifier><identifier>DOI: 10.3390/ma16145030</identifier><identifier>PMID: 37512303</identifier><language>eng</language><publisher>Basel: MDPI AG</publisher><subject>Adsorption ; Amorphization ; Catalytic activity ; Chemical properties ; Decomposition ; Glass substrates ; Manufacturing ; Metal oxides ; Nanostructure ; Nitrogen ; Nitrogen plasma ; Oxygen plasma ; Photocatalysis ; Photodegradation ; Photoelectrons ; Plasma etching ; Radiation ; Sensors ; Silicon dioxide ; Sol-gel processes ; Spectrum analysis ; Stoichiometry ; Tin dioxide ; X ray photoelectron spectroscopy ; Zinc oxides</subject><ispartof>Materials, 2023-07, Vol.16 (14), p.5030</ispartof><rights>2023 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.</rights><rights>2023 by the authors. 2023</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c343t-bbac419107a10f70bdf33231ed51e8f63e4a94adafc760a6c21b9c2dfbc1557d3</cites><orcidid>0000-0003-3037-3601 ; 0000-0001-5577-7456 ; 0000-0001-7905-3700 ; 0000-0002-0372-1802 ; 0000-0003-2942-9823 ; 0000-0002-9739-4178 ; 0000-0002-3973-9051</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://www.ncbi.nlm.nih.gov/pmc/articles/PMC10383562/pdf/$$EPDF$$P50$$Gpubmedcentral$$Hfree_for_read</linktopdf><linktohtml>$$Uhttps://www.ncbi.nlm.nih.gov/pmc/articles/PMC10383562/$$EHTML$$P50$$Gpubmedcentral$$Hfree_for_read</linktohtml><link.rule.ids>230,314,723,776,780,881,27901,27902,53766,53768</link.rule.ids></links><search><creatorcontrib>Pronin, Igor A.</creatorcontrib><creatorcontrib>Sigaev, Alexander P.</creatorcontrib><creatorcontrib>Komolov, Alexei S.</creatorcontrib><creatorcontrib>Zhizhin, Evgeny V.</creatorcontrib><creatorcontrib>Karmanov, Andrey A.</creatorcontrib><creatorcontrib>Yakushova, Nadezhda D.</creatorcontrib><creatorcontrib>Kyashkin, Vladimir M.</creatorcontrib><creatorcontrib>Nishchev, Konstantin N.</creatorcontrib><creatorcontrib>Sysoev, Victor V.</creatorcontrib><creatorcontrib>Goel, Sanket</creatorcontrib><creatorcontrib>Amreen, Khairunnisa</creatorcontrib><creatorcontrib>K, Ramya</creatorcontrib><creatorcontrib>Korotcenkov, Ghenadii</creatorcontrib><title>Effects of Plasma Treatment on the Surface and Photocatalytic Properties of Nanostructured SnO2–SiO2 Films</title><title>Materials</title><description>In this work, we study the effects of treating nanostructured SnO2–SiO2 films derived by a sol-gel method with nitrogen and oxygen plasma. The structural and chemical properties of the films are closely investigated. To quantify surface site activity in the films following treatment, we employed a photocatalytic UV degradation test with brilliant green. Using X-ray photoelectron spectroscopy, it was found that treatment with oxygen plasma led to a high deviation in the stoichiometry of the SnO2 surface and even the appearance of a tin monoxide phase. These samples also exhibited a maximum photocatalytic activity. In contrast, treatment with nitrogen plasma did not lead to any noticeable changes in the material. However, increasing the power of the plasma source from 250 W to 500 W led to the appearance of an SnO fraction on the surface and a reduction in the photocatalytic activity. In general, all the types of plasma treatment tested led to amorphization in the SnO2–SiO2 samples.</description><subject>Adsorption</subject><subject>Amorphization</subject><subject>Catalytic activity</subject><subject>Chemical properties</subject><subject>Decomposition</subject><subject>Glass substrates</subject><subject>Manufacturing</subject><subject>Metal oxides</subject><subject>Nanostructure</subject><subject>Nitrogen</subject><subject>Nitrogen plasma</subject><subject>Oxygen plasma</subject><subject>Photocatalysis</subject><subject>Photodegradation</subject><subject>Photoelectrons</subject><subject>Plasma etching</subject><subject>Radiation</subject><subject>Sensors</subject><subject>Silicon dioxide</subject><subject>Sol-gel processes</subject><subject>Spectrum analysis</subject><subject>Stoichiometry</subject><subject>Tin dioxide</subject><subject>X ray photoelectron spectroscopy</subject><subject>Zinc oxides</subject><issn>1996-1944</issn><issn>1996-1944</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2023</creationdate><recordtype>article</recordtype><sourceid>BENPR</sourceid><recordid>eNpdkc9q3DAQh0VISUKaS55A0EsIbKvRyLJ9CiUkbSF0FzY5i7EsdR1sayvJgdz6Dn3DPkmdP7RJ5jID8_ExP4axYxAfEWvxaSDQoAqBYocdQF3rBdRK7b6Y99lRSrdiLkSoZL3H9rEsQKLAA9ZfeO9sTjx4vuopDcSvo6M8uDHzMPK8cXw9RU_WcRpbvtqEHCxl6u9zZ_kqhq2LuXOPgu80hpTjZPMUXcvX41L--fV73S0lv-z6Ib1n7zz1yR0990N2c3lxff51cbX88u3889XCosK8aBqyCmoQJYHwpWhajygRXFuAq7xGp6hW1JK3pRakrYSmtrL1jYWiKFs8ZGdP3u3UDK61c5ZIvdnGbqB4bwJ15vVm7DbmR7gzILDCQsvZcPJsiOHn5FI2Q5es63saXZiSkZVSoiq01jP64Q16G6Y4zvkeKBQVlKKYqdMnysaQUnT-3zUgzMMjzf9H4l-7yZCk</recordid><startdate>20230716</startdate><enddate>20230716</enddate><creator>Pronin, Igor A.</creator><creator>Sigaev, Alexander P.</creator><creator>Komolov, Alexei S.</creator><creator>Zhizhin, Evgeny V.</creator><creator>Karmanov, Andrey A.</creator><creator>Yakushova, Nadezhda D.</creator><creator>Kyashkin, Vladimir M.</creator><creator>Nishchev, Konstantin N.</creator><creator>Sysoev, Victor V.</creator><creator>Goel, Sanket</creator><creator>Amreen, Khairunnisa</creator><creator>K, Ramya</creator><creator>Korotcenkov, Ghenadii</creator><general>MDPI AG</general><general>MDPI</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8FD</scope><scope>8FE</scope><scope>8FG</scope><scope>ABJCF</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>AZQEC</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>D1I</scope><scope>DWQXO</scope><scope>HCIFZ</scope><scope>JG9</scope><scope>KB.</scope><scope>PDBOC</scope><scope>PIMPY</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope><scope>7X8</scope><scope>5PM</scope><orcidid>https://orcid.org/0000-0003-3037-3601</orcidid><orcidid>https://orcid.org/0000-0001-5577-7456</orcidid><orcidid>https://orcid.org/0000-0001-7905-3700</orcidid><orcidid>https://orcid.org/0000-0002-0372-1802</orcidid><orcidid>https://orcid.org/0000-0003-2942-9823</orcidid><orcidid>https://orcid.org/0000-0002-9739-4178</orcidid><orcidid>https://orcid.org/0000-0002-3973-9051</orcidid></search><sort><creationdate>20230716</creationdate><title>Effects of Plasma Treatment on the Surface and Photocatalytic Properties of Nanostructured SnO2–SiO2 Films</title><author>Pronin, Igor A. ; Sigaev, Alexander P. ; Komolov, Alexei S. ; Zhizhin, Evgeny V. ; Karmanov, Andrey A. ; Yakushova, Nadezhda D. ; Kyashkin, Vladimir M. ; Nishchev, Konstantin N. ; Sysoev, Victor V. ; Goel, Sanket ; Amreen, Khairunnisa ; K, Ramya ; Korotcenkov, Ghenadii</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c343t-bbac419107a10f70bdf33231ed51e8f63e4a94adafc760a6c21b9c2dfbc1557d3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2023</creationdate><topic>Adsorption</topic><topic>Amorphization</topic><topic>Catalytic activity</topic><topic>Chemical properties</topic><topic>Decomposition</topic><topic>Glass substrates</topic><topic>Manufacturing</topic><topic>Metal oxides</topic><topic>Nanostructure</topic><topic>Nitrogen</topic><topic>Nitrogen plasma</topic><topic>Oxygen plasma</topic><topic>Photocatalysis</topic><topic>Photodegradation</topic><topic>Photoelectrons</topic><topic>Plasma etching</topic><topic>Radiation</topic><topic>Sensors</topic><topic>Silicon dioxide</topic><topic>Sol-gel processes</topic><topic>Spectrum analysis</topic><topic>Stoichiometry</topic><topic>Tin dioxide</topic><topic>X ray photoelectron spectroscopy</topic><topic>Zinc oxides</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Pronin, Igor A.</creatorcontrib><creatorcontrib>Sigaev, Alexander P.</creatorcontrib><creatorcontrib>Komolov, Alexei S.</creatorcontrib><creatorcontrib>Zhizhin, Evgeny V.</creatorcontrib><creatorcontrib>Karmanov, Andrey A.</creatorcontrib><creatorcontrib>Yakushova, Nadezhda D.</creatorcontrib><creatorcontrib>Kyashkin, Vladimir M.</creatorcontrib><creatorcontrib>Nishchev, Konstantin N.</creatorcontrib><creatorcontrib>Sysoev, Victor V.</creatorcontrib><creatorcontrib>Goel, Sanket</creatorcontrib><creatorcontrib>Amreen, Khairunnisa</creatorcontrib><creatorcontrib>K, Ramya</creatorcontrib><creatorcontrib>Korotcenkov, Ghenadii</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>Materials Science & Engineering Collection</collection><collection>ProQuest Central (Alumni)</collection><collection>ProQuest Central</collection><collection>ProQuest Central Essentials</collection><collection>ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Materials Science Collection</collection><collection>ProQuest Central</collection><collection>SciTech Premium Collection</collection><collection>Materials Research Database</collection><collection>Materials Science Database</collection><collection>Materials Science Collection</collection><collection>Publicly Available Content Database (Proquest) (PQ_SDU_P3)</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><collection>MEDLINE - Academic</collection><collection>PubMed Central (Full Participant titles)</collection><jtitle>Materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Pronin, Igor A.</au><au>Sigaev, Alexander P.</au><au>Komolov, Alexei S.</au><au>Zhizhin, Evgeny V.</au><au>Karmanov, Andrey A.</au><au>Yakushova, Nadezhda D.</au><au>Kyashkin, Vladimir M.</au><au>Nishchev, Konstantin N.</au><au>Sysoev, Victor V.</au><au>Goel, Sanket</au><au>Amreen, Khairunnisa</au><au>K, Ramya</au><au>Korotcenkov, Ghenadii</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effects of Plasma Treatment on the Surface and Photocatalytic Properties of Nanostructured SnO2–SiO2 Films</atitle><jtitle>Materials</jtitle><date>2023-07-16</date><risdate>2023</risdate><volume>16</volume><issue>14</issue><spage>5030</spage><pages>5030-</pages><issn>1996-1944</issn><eissn>1996-1944</eissn><abstract>In this work, we study the effects of treating nanostructured SnO2–SiO2 films derived by a sol-gel method with nitrogen and oxygen plasma. The structural and chemical properties of the films are closely investigated. To quantify surface site activity in the films following treatment, we employed a photocatalytic UV degradation test with brilliant green. Using X-ray photoelectron spectroscopy, it was found that treatment with oxygen plasma led to a high deviation in the stoichiometry of the SnO2 surface and even the appearance of a tin monoxide phase. These samples also exhibited a maximum photocatalytic activity. In contrast, treatment with nitrogen plasma did not lead to any noticeable changes in the material. However, increasing the power of the plasma source from 250 W to 500 W led to the appearance of an SnO fraction on the surface and a reduction in the photocatalytic activity. 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| subjects | Adsorption Amorphization Catalytic activity Chemical properties Decomposition Glass substrates Manufacturing Metal oxides Nanostructure Nitrogen Nitrogen plasma Oxygen plasma Photocatalysis Photodegradation Photoelectrons Plasma etching Radiation Sensors Silicon dioxide Sol-gel processes Spectrum analysis Stoichiometry Tin dioxide X ray photoelectron spectroscopy Zinc oxides |
| title | Effects of Plasma Treatment on the Surface and Photocatalytic Properties of Nanostructured SnO2–SiO2 Films |
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