Depth profiling and standardization from the back side of a sample for accurate analyses: Emphasis on quantifying low‐fluence, shallow implants in diamond‐like carbon

Rationale Back‐side thinning of wafers is used to eliminate issues with transient sputtering when analyzing near‐surface element distributions. Precise and accurate calibrated implants are created by including a standard reference material during the implantation. Combining these methods allows accu...

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Veröffentlicht in:	Rapid communications in mass spectrometry 2023-03, Vol.37 (6), p.e9454-n/a
Hauptverfasser:	Rieck, Karen D., Jurewicz, Amy J. G., Hervig, Richard L., Williams, Peter, Olinger, Chad T., Wiens, Roger C., Ogliore, Ryan C.
Format:	Artikel
Sprache:	eng
Schlagworte:	Carbon Depth profiling Diamonds Fluence Genesis mission Implants Reference materials Solar wind Transplants & implants Wafers
Online-Zugang:	Volltext
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