Investigations on the Origin of Topotactic Phase Transition of LaCoO 3 Thin Films with In Situ XRD and Ambient Pressure Hard X-ray Photoelectron Spectroscopy

With the applications of in situ X-ray diffraction (XRD), electrical - measurement, and ambient pressure hard X-ray photoelectron spectroscopy (AP-HAXPES), the characteristics of the topotactic phase transition of LaCoO (LCO) thin films are examined. XRD measurements show clear evidence of structura...

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Veröffentlicht in:	ACS applied materials & interfaces 2025-01, Vol.17 (1), p.1499-1508
Hauptverfasser:	Shin, Hyunsuk, Yun, Youngmin, Seo, Okkyun, Kim, Seongeun, Seo, Minsik, Kim, Dongwoo, Lim, Hojoon, Oh, Hojun, Jang, Subin, Kim, Kyungmin, Kang, Sae Hyun, Hunt, Adrian, Waluyo, Iradwikanari, Noh, Do Young, Mun, Bongjin Simon, Kang, Hyon Chol
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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