Polyvinyl alcohol: a high-resolution hydrogel resist for humidity-sensitive micro-/nanostructure
A high-resolution nanopatterning technique is desirable with the present rapid development of hydrogel nanodevices. Here, we demonstrate that polyvinyl alcohol (PVA), a popular polymeric hydrogel, can function as the negative-tone resist for electron beam lithography (EBL) with a resolution capabili...
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| Veröffentlicht in: | Nanotechnology 2020-10, Vol.31 (42), p.425303-425303 |
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| container_issue | 42 |
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| container_title | Nanotechnology |
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| creator | Zhang, Jian Huang, Chao Chen, Yingxin Wang, Hu Gong, Zhongmiao Chen, Weiqian Ge, Haixiong Hu, Xin Zhang, Xuefeng |
| description | A high-resolution nanopatterning technique is desirable with the present rapid development of hydrogel nanodevices. Here, we demonstrate that polyvinyl alcohol (PVA), a popular polymeric hydrogel, can function as the negative-tone resist for electron beam lithography (EBL) with a resolution capability as narrow as 50 nm half-pitch. Furthermore, the hydrophilic groups of PVA are stable after EBL exposure, and thus the pattern still shows rapid responsivity to humidity change. An aqueous nanopatterning process including dissolution, spin-coating and development is setup, which is friendly for organic device fabrication free of organic solvent. This high-resolution nanopatterning technique with PVA is helpful for the design and realization of hydrogel-related nanodevices in the future. |
| doi_str_mv | 10.1088/1361-6528/ab9da7 |
| format | Article |
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Here, we demonstrate that polyvinyl alcohol (PVA), a popular polymeric hydrogel, can function as the negative-tone resist for electron beam lithography (EBL) with a resolution capability as narrow as 50 nm half-pitch. Furthermore, the hydrophilic groups of PVA are stable after EBL exposure, and thus the pattern still shows rapid responsivity to humidity change. An aqueous nanopatterning process including dissolution, spin-coating and development is setup, which is friendly for organic device fabrication free of organic solvent. This high-resolution nanopatterning technique with PVA is helpful for the design and realization of hydrogel-related nanodevices in the future.</description><identifier>ISSN: 0957-4484</identifier><identifier>EISSN: 1361-6528</identifier><identifier>DOI: 10.1088/1361-6528/ab9da7</identifier><identifier>PMID: 32554892</identifier><identifier>CODEN: NNOTER</identifier><language>eng</language><publisher>England: IOP Publishing</publisher><subject>electron beam lithography ; high resolution ; humidity responsivity ; hydrogel nanostructure ; polyvinyl alcohol</subject><ispartof>Nanotechnology, 2020-10, Vol.31 (42), p.425303-425303</ispartof><rights>2020 IOP Publishing Ltd</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c406t-e90e402aaa4acffa2ec3670e826d3f1613e2533099c00bec1127b450e4501c253</citedby><cites>FETCH-LOGICAL-c406t-e90e402aaa4acffa2ec3670e826d3f1613e2533099c00bec1127b450e4501c253</cites><orcidid>0000-0002-9519-9731 ; 0000-0001-7181-6021</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://iopscience.iop.org/article/10.1088/1361-6528/ab9da7/pdf$$EPDF$$P50$$Giop$$H</linktopdf><link.rule.ids>314,780,784,27924,27925,53846,53893</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/32554892$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Zhang, Jian</creatorcontrib><creatorcontrib>Huang, Chao</creatorcontrib><creatorcontrib>Chen, Yingxin</creatorcontrib><creatorcontrib>Wang, Hu</creatorcontrib><creatorcontrib>Gong, Zhongmiao</creatorcontrib><creatorcontrib>Chen, Weiqian</creatorcontrib><creatorcontrib>Ge, Haixiong</creatorcontrib><creatorcontrib>Hu, Xin</creatorcontrib><creatorcontrib>Zhang, Xuefeng</creatorcontrib><title>Polyvinyl alcohol: a high-resolution hydrogel resist for humidity-sensitive micro-/nanostructure</title><title>Nanotechnology</title><addtitle>Nano</addtitle><addtitle>Nanotechnology</addtitle><description>A high-resolution nanopatterning technique is desirable with the present rapid development of hydrogel nanodevices. Here, we demonstrate that polyvinyl alcohol (PVA), a popular polymeric hydrogel, can function as the negative-tone resist for electron beam lithography (EBL) with a resolution capability as narrow as 50 nm half-pitch. Furthermore, the hydrophilic groups of PVA are stable after EBL exposure, and thus the pattern still shows rapid responsivity to humidity change. An aqueous nanopatterning process including dissolution, spin-coating and development is setup, which is friendly for organic device fabrication free of organic solvent. This high-resolution nanopatterning technique with PVA is helpful for the design and realization of hydrogel-related nanodevices in the future.</description><subject>electron beam lithography</subject><subject>high resolution</subject><subject>humidity responsivity</subject><subject>hydrogel nanostructure</subject><subject>polyvinyl alcohol</subject><issn>0957-4484</issn><issn>1361-6528</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2020</creationdate><recordtype>article</recordtype><recordid>eNp1kL1PwzAQxS0EoqWwM6GMDISeHSdN2FDFl1QJBpiN41waV05c7KRS_ntSpXRjOunde093P0KuKdxTSNM5jRIaJjFL5zLPCrk4IdOjdEqmkMWLkPOUT8iF9xsASlNGz8kkYnHM04xNyfeHNf1ON70JpFG2suYhkEGl11Xo0FvTtdo2QdUXzq7RBIOmfRuU1gVVV-tCt33osfG61TsMaq2cDeeNbKxvXafazuElOSul8Xh1mDPy9fz0uXwNV-8vb8vHVag4JG2IGSAHJqXkUpWlZKiiZAGYsqSISprQCFkcRZBlCiBHRSlb5DweQjFQNaxm5Hbs3Tr706FvRa29QmNkg7bzgnEaswwyBoMVRutwrfcOS7F1upauFxTEnqvYQxR7iGLkOkRuDu1dXmNxDPyBHAx3o0HbrdjYzjXDs__3_QLtNoN6</recordid><startdate>20201016</startdate><enddate>20201016</enddate><creator>Zhang, Jian</creator><creator>Huang, Chao</creator><creator>Chen, Yingxin</creator><creator>Wang, Hu</creator><creator>Gong, Zhongmiao</creator><creator>Chen, Weiqian</creator><creator>Ge, Haixiong</creator><creator>Hu, Xin</creator><creator>Zhang, Xuefeng</creator><general>IOP Publishing</general><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope><orcidid>https://orcid.org/0000-0002-9519-9731</orcidid><orcidid>https://orcid.org/0000-0001-7181-6021</orcidid></search><sort><creationdate>20201016</creationdate><title>Polyvinyl alcohol: a high-resolution hydrogel resist for humidity-sensitive micro-/nanostructure</title><author>Zhang, Jian ; Huang, Chao ; Chen, Yingxin ; Wang, Hu ; Gong, Zhongmiao ; Chen, Weiqian ; Ge, Haixiong ; Hu, Xin ; Zhang, Xuefeng</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c406t-e90e402aaa4acffa2ec3670e826d3f1613e2533099c00bec1127b450e4501c253</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2020</creationdate><topic>electron beam lithography</topic><topic>high resolution</topic><topic>humidity responsivity</topic><topic>hydrogel nanostructure</topic><topic>polyvinyl alcohol</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Zhang, Jian</creatorcontrib><creatorcontrib>Huang, Chao</creatorcontrib><creatorcontrib>Chen, Yingxin</creatorcontrib><creatorcontrib>Wang, Hu</creatorcontrib><creatorcontrib>Gong, Zhongmiao</creatorcontrib><creatorcontrib>Chen, Weiqian</creatorcontrib><creatorcontrib>Ge, Haixiong</creatorcontrib><creatorcontrib>Hu, Xin</creatorcontrib><creatorcontrib>Zhang, Xuefeng</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><jtitle>Nanotechnology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Zhang, Jian</au><au>Huang, Chao</au><au>Chen, Yingxin</au><au>Wang, Hu</au><au>Gong, Zhongmiao</au><au>Chen, Weiqian</au><au>Ge, Haixiong</au><au>Hu, Xin</au><au>Zhang, Xuefeng</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Polyvinyl alcohol: a high-resolution hydrogel resist for humidity-sensitive micro-/nanostructure</atitle><jtitle>Nanotechnology</jtitle><stitle>Nano</stitle><addtitle>Nanotechnology</addtitle><date>2020-10-16</date><risdate>2020</risdate><volume>31</volume><issue>42</issue><spage>425303</spage><epage>425303</epage><pages>425303-425303</pages><issn>0957-4484</issn><eissn>1361-6528</eissn><coden>NNOTER</coden><abstract>A high-resolution nanopatterning technique is desirable with the present rapid development of hydrogel nanodevices. Here, we demonstrate that polyvinyl alcohol (PVA), a popular polymeric hydrogel, can function as the negative-tone resist for electron beam lithography (EBL) with a resolution capability as narrow as 50 nm half-pitch. Furthermore, the hydrophilic groups of PVA are stable after EBL exposure, and thus the pattern still shows rapid responsivity to humidity change. An aqueous nanopatterning process including dissolution, spin-coating and development is setup, which is friendly for organic device fabrication free of organic solvent. This high-resolution nanopatterning technique with PVA is helpful for the design and realization of hydrogel-related nanodevices in the future.</abstract><cop>England</cop><pub>IOP Publishing</pub><pmid>32554892</pmid><doi>10.1088/1361-6528/ab9da7</doi><tpages>6</tpages><orcidid>https://orcid.org/0000-0002-9519-9731</orcidid><orcidid>https://orcid.org/0000-0001-7181-6021</orcidid></addata></record> |
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| source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
| subjects | electron beam lithography high resolution humidity responsivity hydrogel nanostructure polyvinyl alcohol |
| title | Polyvinyl alcohol: a high-resolution hydrogel resist for humidity-sensitive micro-/nanostructure |
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