Soft Coulomb gap and asymmetric scaling towards metal-insulator quantum criticality in multilayer MoS 2

Quantum localization-delocalization of carriers are well described by either carrier-carrier interaction or disorder. When both effects come into play, however, a comprehensive understanding is not well established mainly due to complexity and sparse experimental data. Recently developed two-dimensi...

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Veröffentlicht in:Nature communications 2018-05, Vol.9 (1), p.2052
Hauptverfasser: Moon, Byoung Hee, Bae, Jung Jun, Joo, Min-Kyu, Choi, Homin, Han, Gang Hee, Lim, Hanjo, Lee, Young Hee
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Bae, Jung Jun
Joo, Min-Kyu
Choi, Homin
Han, Gang Hee
Lim, Hanjo
Lee, Young Hee
description Quantum localization-delocalization of carriers are well described by either carrier-carrier interaction or disorder. When both effects come into play, however, a comprehensive understanding is not well established mainly due to complexity and sparse experimental data. Recently developed two-dimensional layered materials are ideal in describing such mesoscopic critical phenomena as they have both strong interactions and disorder. The transport in the insulating phase is well described by the soft Coulomb gap picture, which demonstrates the contribution of both interactions and disorder. Using this picture, we demonstrate the critical power law behavior of the localization length, supporting quantum criticality. We observe asymmetric critical exponents around the metal-insulator transition through temperature scaling analysis, which originates from poor screening in insulating regime and conversely strong screening in metallic regime due to free carriers. The effect of asymmetric scaling behavior is weakened in monolayer MoS due to a dominating disorder.
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title Soft Coulomb gap and asymmetric scaling towards metal-insulator quantum criticality in multilayer MoS 2
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