Magnetic and electrical characterization of nickel-rich NiFe thin films synthesized by atomic layer deposition and subsequent thermal reduction

Nickel-rich NiFe thin films (Ni92Fe8, Ni89Fe11 and Ni83Fe17) were prepared by combining atomic layer deposition (ALD) with a subsequent thermal reduction process. In order to obtain NixFe1−xOy films, one ALD supercycle was performed according to the following sequence: m NiCp2/O3, with m = 1, 2 or 3...

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Veröffentlicht in:	Nanotechnology 2016-08, Vol.27 (34), p.345707-345707
Hauptverfasser:	Espejo, A P, Zierold, R, Gooth, J, Dendooven, J, Detavernier, C, Escrig, J, Nielsch, K
Format:	Artikel
Sprache:	eng
Schlagworte:	Atomic layer deposition electrical characterization Ferrous alloys Intermetallics Iron compounds magnetic characterization Nickel Nickel base alloys Nickel compounds NiFe thin films Thermal reduction Thin films
Online-Zugang:	Volltext
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