Soft-mask fabrication of gallium arsenide nanomembranes for integrated quantum photonics
We report on the fabrication of quantum photonic integrated circuits based on suspended GaAs membranes. The fabrication process consists of a single lithographic step followed by inductively coupled-plasma dry etching through an electron-beam-resist mask and wet etching of a sacrificial layer. This...
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| Veröffentlicht in: | Nanotechnology 2015-12, Vol.26 (48), p.484002-484002 |
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| container_issue | 48 |
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| container_title | Nanotechnology |
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| creator | Midolo, L Pregnolato, T Kiršansk, G Stobbe, S |
| description | We report on the fabrication of quantum photonic integrated circuits based on suspended GaAs membranes. The fabrication process consists of a single lithographic step followed by inductively coupled-plasma dry etching through an electron-beam-resist mask and wet etching of a sacrificial layer. This method does not require depositing, etching, and stripping a hard mask, greatly reducing fabrication time and costs, while at the same time yielding devices of excellent structural quality. We discuss in detail the procedures for cleaning the resist residues caused by the plasma etching and present a statistical analysis of the etched feature size after each fabrication step. |
| doi_str_mv | 10.1088/0957-4484/26/48/484002 |
| format | Article |
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The fabrication process consists of a single lithographic step followed by inductively coupled-plasma dry etching through an electron-beam-resist mask and wet etching of a sacrificial layer. This method does not require depositing, etching, and stripping a hard mask, greatly reducing fabrication time and costs, while at the same time yielding devices of excellent structural quality. 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We discuss in detail the procedures for cleaning the resist residues caused by the plasma etching and present a statistical analysis of the etched feature size after each fabrication step.</description><subject>Devices</subject><subject>Etching</subject><subject>Gallium arsenide</subject><subject>III-V semiconconductors</subject><subject>integrated optical circuits</subject><subject>Masks</subject><subject>nanofabrication</subject><subject>Nanostructure</subject><subject>Nanotechnology</subject><subject>photonic crystals</subject><subject>Photonics</subject><subject>plasma etching</subject><subject>quantum photonics</subject><subject>Resists</subject><issn>0957-4484</issn><issn>1361-6528</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2015</creationdate><recordtype>article</recordtype><recordid>eNqNkUtr3TAQhUVoSW4efyF4mS6cq7elZQh9QaCLNpCdkK1RotSWHMle5N9Xl5sECoEWBmYW35kZzkHonOBLgpXaYi26lnPFt1RuuarFMaYHaEOYJK0UVH1AmzfoCB2X8ogxIYqSQ3REpaiEwht09zP5pZ1s-d142-cw2CWk2CTf3NtxDOvU2FwgBgdNtDFNMPXZRiiNT7kJcYH7bBdwzdNq41Lp-SEtKYahnKKP3o4Fzl76Cbr98vnX9bf25sfX79dXN-0gmFha6LEDza1wjHkOUmBHOecDdVpxp3kPQPs6SuGEBdJrP2jJO911dPCWK3aCLvZ755yeViiLmUIZYBzrl2kthnSaUaGIwv-BMkaUplRUVO7RIadSMngz5zDZ_GwINrsAzM5bs_PWUGm4MvsAqvD85cbaT-DeZK-OV4DugZBm85jWHKs7_9766R3RLpC_ODM7z_4A5cOejA</recordid><startdate>20151204</startdate><enddate>20151204</enddate><creator>Midolo, L</creator><creator>Pregnolato, T</creator><creator>Kiršansk, G</creator><creator>Stobbe, S</creator><general>IOP Publishing</general><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>F28</scope><scope>FR3</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20151204</creationdate><title>Soft-mask fabrication of gallium arsenide nanomembranes for integrated quantum photonics</title><author>Midolo, L ; Pregnolato, T ; Kiršansk, G ; Stobbe, S</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c535t-eb0de94a5d33f4e650d2444c2d984d94bee2b98465d5ae1b9fc96479772cfa483</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2015</creationdate><topic>Devices</topic><topic>Etching</topic><topic>Gallium arsenide</topic><topic>III-V semiconconductors</topic><topic>integrated optical circuits</topic><topic>Masks</topic><topic>nanofabrication</topic><topic>Nanostructure</topic><topic>Nanotechnology</topic><topic>photonic crystals</topic><topic>Photonics</topic><topic>plasma etching</topic><topic>quantum photonics</topic><topic>Resists</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Midolo, L</creatorcontrib><creatorcontrib>Pregnolato, T</creatorcontrib><creatorcontrib>Kiršansk, G</creatorcontrib><creatorcontrib>Stobbe, S</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>ANTE: Abstracts in New Technology & Engineering</collection><collection>Engineering Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Nanotechnology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Midolo, L</au><au>Pregnolato, T</au><au>Kiršansk, G</au><au>Stobbe, S</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Soft-mask fabrication of gallium arsenide nanomembranes for integrated quantum photonics</atitle><jtitle>Nanotechnology</jtitle><stitle>NANO</stitle><addtitle>Nanotechnology</addtitle><date>2015-12-04</date><risdate>2015</risdate><volume>26</volume><issue>48</issue><spage>484002</spage><epage>484002</epage><pages>484002-484002</pages><issn>0957-4484</issn><eissn>1361-6528</eissn><coden>NNOTER</coden><abstract>We report on the fabrication of quantum photonic integrated circuits based on suspended GaAs membranes. 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| ispartof | Nanotechnology, 2015-12, Vol.26 (48), p.484002-484002 |
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| source | IOP Publishing Journals; Institute of Physics (IOP) Journals - HEAL-Link |
| subjects | Devices Etching Gallium arsenide III-V semiconconductors integrated optical circuits Masks nanofabrication Nanostructure Nanotechnology photonic crystals Photonics plasma etching quantum photonics Resists |
| title | Soft-mask fabrication of gallium arsenide nanomembranes for integrated quantum photonics |
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